A mechanistic change in the alkaline hydrolysis of esters of fluorene-9-carboxylic acid
作者:Manoochehr Alborz、Kenneth T. Douglas
DOI:10.1039/c39800000728
日期:——
The Brønsted leaving group (β1g) plot for the alkalinehydrolysis of fluorene-9-carboxylate esters in the pH region corresponding to the existence of the ester anion shows a minimum flanked by a region of high negative β1g(-1·01), corresponding to an E1cb pathway and, for esters of pK1g > 9·5, a region of positive β1g(+0·11).
PHOTOSENSITIVE COMPOUND, PHOTOSENSITIVE COMPOSITION, RESIST PATTERN FORMING METHOD, AND DEVICE PRODUCTION PROCESS
申请人:Ito Toshiki
公开号:US20100221656A1
公开(公告)日:2010-09-02
A photosensitive compound has two or more structural units, in a molecule, represented by the following general formula (1):
wherein R
1
to R
8
are selected from the group consisting of a hydrogen atom, a halogen atom, an alkyl group, an alkoxy group, an acetoxy group, a phenyl group, a naphthyl group, and an alkyl group in which some or all of the hydrogen atoms are optionally replaced by fluorine atoms; R
9
is a hydrogen atom or a hydroxyl group; X is a substituted or unsubstituted phenylene group or a substituted or unsubstituted naphthalene group; and Y is an oxygen atom or a single bond.