1-carboxy-4-acryloyloxy-4-isopropyladamantane | 251564-72-4

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 羧酸及其衍生物
• 英文名称: 1-carboxy-4-acryloyloxy-4-isopropyladamantane
• 英文别名: 4-propan-2-yl-4-prop-2-enoyloxyadamantane-1-carboxylic acid
• CAS: 251564-72-4
• 化学式: C₁₇H₂₄O₄
• 分子量: 292.375
• InChiKey: KKEFGFAUDGAHSQ-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.2
• 重原子数：
  21
• 可旋转键数：
  5
• 环数：
  4.0
• sp3杂化的碳原子比例：
  0.76
• 拓扑面积：
  63.6
• 氢给体数：
  1
• 氢受体数：
  4

反应信息

• 作为产物：
  描述：

  1-carboxy-4-hydroxy-4-isopropyladamantane 以81%的产率得到1-carboxy-4-acryloyloxy-4-isopropyladamantane
  参考文献：
  名称：

  EP1000924

  摘要：

  公开号：

文献信息

• Acid-sensitive compound and resin composition for photoresist
  申请人：Daicel Chemical Industries, Ltd.

  公开号：US20030180662A1

  公开（公告）日：2003-09-25

  The photoresist resin composition comprises a polymer containing an acid-responsive compound unit of the following formula (e.g. an adamantane skeleton) and a photoactive acid precursor. R 1 may be an alkyl group having a tertiary carbon atom in the 1-position and the Z ring is a bridged-ring hydrocarbon ring comprising 2 to 4 rings. 1 wherein R 1 and R 2 are the same or different from each other and each represents a hydrogen atom, an alkyl group or a cycloalkyl group; R 3 represents a hydrogen atom or a methyl group; R 4 represents a hydrogen atom, a halogen atom, an alkyl group, an oxygen-containing group, an amino group or an N-substituted amino group; the Z ring represents a monocyclic or polycyclic alicyclic hydrocarbon ring; n represents an integer of not less than 1; with proviso that R 4 does not concurrently represent a hydrogen atom, and may be different over n occurrences; in formula (1), R 1 and R 2 may, jointly and together with the adjacent carbon atom, form an alicyclic hydrocarbon ring. The above photoresist resin composition is high in etching resistance, can be solubilized by irradiation, and is capable of providing a finer line pattern.

  照片阻聚合物组成包括聚合物和光活性酸前体，其中聚合物含有以下式子的酸响应化合物单元（例如，金刚烷骨架）：R1可以是1-位具有三级碳原子的烷基基团，Z环是由2至4个环组成的桥环烃环。其中，R1和R2相同或不同，每个表示氢原子、烷基或环烷基；R3表示氢原子或甲基基团；R4表示氢原子、卤素原子、烷基、含氧基团、氨基或N-取代氨基；Z环表示单环或多环脂环烃环；n表示不小于1的整数；但是R4不能同时表示氢原子，在n次出现时可以不同；在式（1）中，R1和R2可以与相邻碳原子共同形成脂环烃环。上述照片阻聚合物组成具有高蚀刻抗性，可以通过辐射溶解，并能够提供更细的线型图案。
• ACID-SENSITIVE COMPOUND AND RESIN COMPOSITION FOR PHOTORESIST
  申请人：Daichel Chemical Industries Ltd

  公开号：EP1000924A1

  公开（公告）日：2000-05-17

  The photoresist resin composition comprises a polymer containing an acid-responsive compound unit of the following formula (e.g. an adamantane skeleton) and a photoactive acid precursor. R1 may be an alkyl group having a tertiary carbon atom in the 1-position and the Z ring is a bridged-ring hydrocarbon ring comprising 2 to 4 rings.    wherein R1 and R2 are the same or different from each other and each represents a hydrogen atom, an alkyl group or a cycloalkyl group; R3 represents a hydrogen atom or a methyl group; R4 represents a hydrogen atom, a halogen atom, an alkyl group, an oxygen-containing group, an amino group or an N-substituted amino group; the Z ring represents a monocyclic or polycyclic alicyclic hydrocarbon ring; n represents an integer of not less than 1; with proviso that R4 does not concurrently represent a hydrogen atom, and may be different over n occurrences; in formula (1), R1 and R2 may, jointly and together with the adjacent carbon atom, form an alicyclic hydrocarbon ring. The above photoresist resin composition is high in etching resistance, can be solubilized by irradiation, and is capable of providing a finer line pattern.

  光致抗蚀剂树脂组合物包括含有下式酸响应化合物单元（如金刚烷骨架）和光活性酸前体的聚合物。R1 可以是在 1 位上有一个叔碳原子的烷基，Z 环是由 2 至 4 个环组成的桥环烃环。 其中 R1 和 R2 彼此相同或不同，各自代表氢原子、烷基或环烷基；R3 代表氢原子或甲基；R4 代表氢原子、卤素原子、烷基、含氧基团、氨基或 N-取代氨基；在式(1)中，R1 和 R2 可与相邻碳原子共同形成脂环烃环。上述光刻胶树脂组合物具有很高的抗蚀刻性，可通过辐照溶解，并能提供更精细的线条图案。
• Photoresist copolymer
  申请人：Daicel Chemical Industries, Ltd.

  公开号：EP1445266A2

  公开（公告）日：2004-08-11

  A photoresist copolymer comprising    a monomer unit corresponding to a monomer represented by the following formula (11a) or (12a):    wherein R1 and R2 are the same or different and each represents a C1-4alkyl group, and R3 represents a hydrogen atom or methyl group; and    a lactone ring-containing monomer unit.

  一种光阻共聚物，包括 与下式（11a）或（12a）所代表的单体相对应的单体单元： 其中 R1 和 R2 相同或不同，各自代表 C1-4 烷基，R3 代表氢原子或甲基；以及 含内酯环的单体单元。
• EP1000924
  申请人：——

  公开号：——

  公开（公告）日：——