Propionic acid, 2-methyl-2-hydroxy propyl ester

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 羧酸及其衍生物
• 英文名称: Propionic acid, 2-methyl-2-hydroxy propyl ester
• 英文别名: 2-hydroxypropyl 2-methylpropanoate
• 化学式: C₇H₁₄O₃
• 分子量: 146.18
• InChiKey: TWVANRHJFGGUTM-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  0.9
• 重原子数：
  10
• 可旋转键数：
  4
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.86
• 拓扑面积：
  46.5
• 氢给体数：
  1
• 氢受体数：
  3

文献信息

• Chemically amplified resist and a resist composition
  申请人：——

  公开号：US20030181629A1

  公开（公告）日：2003-09-25

  The present invention relates to a polymer for a chemically amplified resist and a resist composition using the same. The present invention provides a polymer represented by the Formula (1) and a chemically resist composition for deep ultraviolet light comprising the same. The chemically amplified resist composition comprising the polymer represented by the formula (1) of the present invention responds to mono wavelength in a micro-lithography process and can embody a micro-pattern of high resolution on a substrate. 1

  本发明涉及一种用于化学放大光刻胶的聚合物及使用该聚合物的光刻胶组合物。本发明提供了一种由式（1）表示的聚合物，并且还提供了一种深紫外光化学放大光刻胶组合物，该光刻胶组合物包括该聚合物。本发明所述的由式（1）表示的聚合物的化学放大光刻胶组合物在微影工艺中对单色波长做出响应，能够在基板上实现高分辨率的微型图案。
• Photosensitive polymer and chemically amplified photoresist composition including the same
  申请人：Kim Deog-Bae

  公开号：US20050271977A1

  公开（公告）日：2005-12-08

  A photosensitive polymer for forming high-resolution fine circuit patterns with an exposure light source of a short wavelength, and a chemically amplified photoresist composition including the polymer, are disclosed. The photosensitive polymer is represented by the following Formula 1, wherein R 1 is a hydrogen atom, R 2 is a hydrogen atom, R 3 is a chlorine atom, a bromine atom, hydroxy, cyano, t-butoxy, CH 2 NH 2 , CONH 2 , CH═NH, CH(OH)NH 2 or C(OH)═NH group, R 4 is a hydrogen atom or methyl group, each of 1-x-y-z, x, y and z is a degree of polymerization of each repeating unit constituting the photosensitive polymer, x, y and z are 0.01 to 0.8, respectively, and n is 1 or 2.

  本发明公开了一种光敏聚合物，用于利用短波长的曝光光源形成高分辨率的细电路图案，以及包括该聚合物的化学增感光阻剂组合物。该光敏聚合物由以下式子1表示，其中R1为氢原子，R2为氢原子，R3为氯原子、溴原子、羟基、氰基、叔丁氧基、CH2NH2、CONH2、CH═NH、CH(OH)NH2或C(OH)═NH基团，R4为氢原子或甲基基团，1-x-y-z、x、y和z分别为构成光敏聚合物的每个重复单元的聚合度，x、y和z分别为0.01至0.8，n为1或2。
• Fluorine-containing polybenzoxazole
  申请人：Central Glass Company, Limited

  公开号：US20010051705A1

  公开（公告）日：2001-12-13

  The invention relates to a fluorine-containing polybenzoxazole including a structural unit represented by the general formula ( 1 ): 1 where X is a tetravalent organic group containing an aromatic ring, and two sets of N and O are each bonded to the ortho positions of the aromatic ring of X such that two five-membered rings are formed next to the aromatic ring of X. This polybenzoxazole demonstrates low dielectric constant and low coefficient of thermal expansion while maintaining the properties of polybenzoxazole including mechanical strength and thermal stability.

  本发明涉及一种含氟聚苯并恶唑，其结构单元由通式 ( 1 ): 1 这种聚苯并恶唑具有低介电常数和低热膨胀系数，同时保持了聚苯并恶唑的特性，包括机械强度和热稳定性。
• DISPERSING AGENT
  申请人：Ekfa Chemicals B.V.

  公开号：EP0956153A1

  公开（公告）日：1999-11-17
• Multi-branched polymer, process for producing the same, and applications thereof
  申请人：Mitsui Chemicals, Inc.

  公开号：EP1457512B1

  公开（公告）日：2008-05-07

表征谱图