Propylene glycol, monoallyl ether, acetate

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 羧酸及其衍生物
• 英文名称: Propylene glycol, monoallyl ether, acetate
• 英文别名: 1-prop-2-enoxypropan-2-yl acetate
• 化学式: C₈H₁₄O₃
• 分子量: 158.19
• InChiKey: RGLXHIFBHJMQQI-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  1
• 重原子数：
  11
• 可旋转键数：
  6
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.62
• 拓扑面积：
  35.5
• 氢给体数：
  0
• 氢受体数：
  3

文献信息

• Novel sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process
  申请人：——

  公开号：US20040167322A1

  公开（公告）日：2004-08-26

  A chemical amplification type resist composition comprising a specific benzenesulfonyldiazomethane containing a long-chain alkoxyl group at the 2-position on benzene ring has many advantages including improved resolution, improved focus latitude, minimized line width variation or shape degradation even on long-term PED, minimized debris left after coating, development and peeling, and improved pattern profile after development and is thus suited for microfabrication.

  一种化学放大型抗蚀组合物，包括在苯环上的2-位含有长链烷氧基基团的特定苯磺酰二氮甲烷，具有许多优点，包括提高分辨率，改善焦点宽度，即使在长期PED上也减少线宽变化或形状退化，涂层、显影和剥离后减少残留物，并在显影后改善图案轮廓，因此适用于微加工。
• Photoacid generators, chemically amplified resist compositions, and patterning process
  申请人：Ohsawa Youichi

  公开号：US20070292768A1

  公开（公告）日：2007-12-20

  A photoacid generator has formula (1). A chemically amplified resist composition comprising the photoacid generator has advantages including a high resolution, focus latitude, long-term PED dimensional stability, and a satisfactory pattern profile shape. When the photoacid generator is combined with a resin having acid labile groups other than those of the acetal type, resolution and top loss are improved. The composition is suited for deep UV lithography.

  一种光酸发生剂的化学式为（1）。包括该光酸发生剂的化学增感抗蚀组合物具有诸如高分辨率、焦点宽度、长期PED尺寸稳定性和令人满意的图案轮廓形状等优点。当该光酸发生剂与具有除了缩醛类型以外的酸敏感基团的树脂结合时，可以改善分辨率和顶部损失。该组合物适用于深紫外光刻。
• SEMICONDUCTING LIGHT EMITTING MATERIAL
  申请人：Merck Patent GmbH

  公开号：US20210130684A1

  公开（公告）日：2021-05-06

  Suggested is a semiconductor nano-sized light emitting material having a ligand.

  建议的是一种具有配体的半导体纳米尺寸发光材料。
• Novel sulfonyldiazomethanes, photoacid generations, resist compositions, and patterning process
  申请人：——

  公开号：US20030180653A1

  公开（公告）日：2003-09-25

  A chemical amplification type resist composition contains as a photoacid generator a sulfonyldiazomethane compound of formula (1) wherein R is H or C 1-4 alkyl or alkoxy, G is SO 2 or CO, R 3 is C 1-10 alkyl or C 6-14 aryl, p is 1 or 2, q is 0 or 1, p+q=2, n is 0 or 1, m is 3 to 11, and k is 0 to 4. The composition is suited for microfabrication, especially by deep UV lithography because of many advantages including improved resolution and improved pattern profile after development. 1

  一种化学放大型光刻胶组合物包含一种化学放大型光酸发生剂，其化学式为（1），其中R为H或C1-4烷基或烷氧基，G为SO2或CO，R3为C1-10烷基或C6-14芳基，p为1或2，q为0或1，p+q=2，n为0或1，m为3至11，k为0至4。该组合物适用于微细加工，尤其是通过深紫外光刻技术，因为具有许多优点，包括提高分辨率和在显影后改善图案轮廓。
• [EN] COLORED PHOTOSENSITIVE RESIN COMPOSITION AND LIGHT SHIELDING SPACER PREPARED THEREFROM<br/>[FR] COMPOSITION DE RÉSINE PHOTOSENSIBLE COLORÉE ET ÉLÉMENT D'ESPACEMENT PARE-LUMIÈRE PRÉPARÉ PAR CELLE-CI
  申请人：ROHM & HAAS ELECT MATERIALS KOREA LTD

  公开号：WO2017078271A1

  公开（公告）日：2017-05-11

  Disclosed herein is a colored photosensitive resin composition including a copolymer, an epoxy resin compound or a compound derived therefrom, a polymerizable compound, a photoinitiator, and a colorant, wherein the photoinitiator includes an oxime compound and a triazine compound. The composition, when formed into a cured film, may facilitate the fabrication of necessary height difference and satisfy the requirements of sensitivity and an exposure margin for light shielding spacers, and, thus, is useful as a material for manufacturing a light shielding spacer such as a black column spacer used in various electronic parts including the panels of an LCD and an OLED display.

  本文揭示了一种彩色光敏树脂组合物，包括共聚物、环氧树脂化合物或其衍生物、可聚合化合物、光引发剂和着色剂，其中光引发剂包括肟化合物和三嗪化合物。该组合物在形成固化膜时，可以促进所需高度差异的制造，并满足光屏蔽间隔器的灵敏度和曝光余量要求，因此，可用作制造光屏蔽间隔器的材料，例如在包括LCD和OLED显示面板在内的各种电子零件中使用的黑色柱状间隔器。