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2-[2-[2-(2-Butoxyethoxy)ethoxy]ethoxy]ethyl acetate

中文名称
——
中文别名
——
英文名称
2-[2-[2-(2-Butoxyethoxy)ethoxy]ethoxy]ethyl acetate
英文别名
——
2-[2-[2-(2-Butoxyethoxy)ethoxy]ethoxy]ethyl acetate化学式
CAS
——
化学式
C14H28O6
mdl
——
分子量
292.37
InChiKey
XGPAKKIIHOORKP-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    0.8
  • 重原子数:
    20
  • 可旋转键数:
    16
  • 环数:
    0.0
  • sp3杂化的碳原子比例:
    0.93
  • 拓扑面积:
    63.2
  • 氢给体数:
    0
  • 氢受体数:
    6

文献信息

  • PROCESS FOR CLEANING WAFERS
    申请人:KUMON Soichi
    公开号:US20120211025A1
    公开(公告)日:2012-08-23
    A process for cleaning a wafer having an uneven pattern at its surface. The process includes at least the steps of: cleaning the wafer with a cleaning liquid; substituting the cleaning liquid retained in recessed portions of the wafer with a water-repellent liquid chemical after cleaning; and drying the wafer, wherein the cleaning liquid contains 80 mass % or greater of a solvent having a boiling point of 55 to 200° C., and wherein the water-repellent liquid chemical supplied in the substitution step has a temperature of not lower than 40° C. and lower than a boiling point of the water-repellent liquid chemical thereby imparting water repellency at least to surfaces of the recessed portions.
    一种清洗具有不平整表面的晶圆的方法。该方法至少包括以下步骤:使用清洗液清洗晶圆;在清洗后,用一种防液体化学物质替换晶圆凹陷部分中保留的清洗液;并将晶圆干燥,其中,清洗液含有80质量%或更多沸点在55至200℃之间的溶剂,替换步骤中提供的防液体化学物质的温度不低于40℃且低于防液体化学物质的沸点,从而至少赋予凹陷部分表面防性。
  • Phosphor-containing photosensitive resin composition for use in manufacturing plasma display panel
    申请人:Hitachi Chemical Co., Ltd.
    公开号:EP0768573A1
    公开(公告)日:1997-04-16
    Disclosed are a photosensitive resin composition which comprises: (A) a compound having a carboxyl group; (B) a resin having a carboxyl group; (C) a photopolymerizable unsaturated compound having an ethylenic unsaturated group; (D) a photopolymerization initiator which produces free radical by irradiation of active light; and (E) a phosphor, a photosensitive film and a process for preparing a fluorescent pattern using the same, and a phosphor subjected to surface treatment and a process for preparing the same.
    所公开的光敏树脂组合物包括 (A) 具有羧基的化合物; (B) 具有羧基的树脂 (C) 具有乙烯基不饱和基团的可光聚合不饱和化合物; (D) 光聚合引发剂,通过活性光照射产生自由基;以及 (E) 荧光体、 一种光敏胶片和用其制备荧光图案的工艺,以及一种经表面处理的荧光粉和制备荧光粉的工艺。
  • Oil-based inkjet recording ink
    申请人:FUJIFILM Corporation
    公开号:EP2230282A1
    公开(公告)日:2010-09-22
    The invention provides an oil-based inkjet recording ink including, an azo pigment represented by the following Formula (1), a polymer dispersant, a resin and an organic solvent: which has superior recording property onto a vinyl chloride substrate, ink storage stability and ejecting property (including when re-ejected after ejection stopped), wherein, in Formula (1), Z represents a divalent group derived from a 5- to 8-membered heterocycle containing nitrogen atom(s); Y1, Y2, R11, and R12 each independently represent a hydrogen atom or a substituent; G1 and G2 each independently represent a hydrogen atom, an alkyl group, an aralkyl group, an alkenyl group, an alkynyl group, an aryl group or a heterocyclic group; and W1 and W2 each independently represent an alkoxy group, an amino group, a substituted amino group, an alkyl group or an aryl group.
    本发明提供了一种油基喷墨记录墨,包括由下式(1)表示的偶氮颜料、聚合物分散剂、树脂和有机溶剂: 其中,在式(1)中,Z 代表由含有氮原子的 5 至 8 元杂环衍生的二价基团;Y1、Y2、R11 和 R12 各自独立地代表氢原子或取代基;G1 和 G2 各自独立地代表氢原子、烷基、芳烷基、烯基、炔基、芳基或杂环基团;以及 W1 和 W2 各自独立地代表烷氧基、基、取代基、烷基或芳基。
  • OPTICAL SHAPING INK SET, AND METHOD FOR MANUFACTURING OPTICALLY SHAPED ARTICLE
    申请人:Maxell Holdings, Ltd.
    公开号:EP3351366A1
    公开(公告)日:2018-07-25
    There is provided a light curing molding ink set 20 used for a manufacturing method for light curing molding using an ink-jet scheme, comprising a combination of a resin composition 4a for a modeling material used for shaping the modeling material 4 and a resin composition 5a for a supporting material used for shaping the supporting material 5, wherein surface tension Mt (mN/m) of the resin composition 4a for a modeling material is greater than surface tension St (mN/m) of the resin composition 5a for a supporting material, and the surface tension Mt and the surface tension St satisfy the [0 < Mt - St < 5] expression, and this light curing molding ink set 20 can afford a light cured article having the good dimensional accuracy.
    本发明提供了一种光固化成型墨组 20,用于使用喷墨方案的光固化成型制造方法,该墨组 20 由用于成型造型材料 4 的造型材料树脂组合物 4a 和用于成型支撑材料 5 的支撑材料树脂组合物 5a 组成、其中,用于造型材料的树脂组合物 4a 的表面张力 Mt(mN/m)大于用于支撑材料的树脂组合物 5a 的表面张力 St(mN/m),且表面张力 Mt 和表面张力 St 满足[0 < Mt - St < 5]表达式,这种光固化成型油墨组 20 可提供具有良好尺寸精度的光固化制品。
  • RESIN COMPOSITION FOR MODEL MATERIALS, RESIN COMPOSITION FOR SUPPORT MATERIALS, OPTICALLY SHAPED ARTICLE AND METHOD FOR PRODUCING OPTICALLY SHAPED ARTICLE
    申请人:Maxell Holdings, Ltd.
    公开号:EP3330306A1
    公开(公告)日:2018-06-06
    A resin composition for a modeling material for use in shaping a modeling material (4) by an ink-jet photofabrication method, the resin composition comprising, based on 100 parts by weight of the whole resin composition, 19 to 49 parts by weight of a water-insoluble monofunctional ethylenically unsaturated monomer (A), 15 to 50 parts by weight of a di- or more-functional polyfunctional ethylenically unsaturated monomer (B), 10 to 45 parts by weight of an oligomer (C), and a photopolymerization initiator (D). By this resin composition for a modeling material, a photofabrication product having good dimensional accuracy can be obtained.
    一种造型材料的树脂组合物,用于用喷墨照相制造法塑造造型材料(4),该树脂组合物包括,以整个树脂组合物100份(重量)为基准、19 至 49 份(按重量计)不溶性单官能度乙烯基不饱和单体 (A)、15 至 50 份(按重量计)二官能度或多官能度乙烯基不饱和单体 (B)、10 至 45 份(按重量计)低聚物 (C) 和光聚合引发剂 (D)。通过这种用于造型材料的树脂组合物,可以获得具有良好尺寸精度的光加工产品。
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