Methoxyacetic acid, pentyl ester

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 羧酸及其衍生物
• 英文名称: Methoxyacetic acid, pentyl ester
• 英文别名: pentyl 2-methoxyacetate
• 化学式: C₈H₁₆O₃
• 分子量: 160.21
• InChiKey: UWPUJNYESSOWDM-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  1.8
• 重原子数：
  11
• 可旋转键数：
  7
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.88
• 拓扑面积：
  35.5
• 氢给体数：
  0
• 氢受体数：
  3

文献信息

• RAPIDLY CURING CYANOACRYLATES AS ADHESIVES
  申请人：Swords Noeleen

  公开号：US20100029978A1

  公开（公告）日：2010-02-04

  The present invention relates to a polymerizable adhesive composition which comprises, at least as one constituent, a cyanacrylate component and which requires a comparitively short time for curing when used on surfaces. The present invention therefore also includes a method for the production of the cyanacrylate component described above, and the cyanacrylate component as such.

  本发明涉及一种聚合粘合剂组成物，至少包括一种氰基丙烯酸酯组分，并在表面使用时需要相对较短的固化时间。因此，本发明还包括上述氰基丙烯酸酯组分的制备方法以及氰基丙烯酸酯组分本身。
• FILM-FORMING COMPOSITION INCLUDING FLUORINE-CONTAINING SURFACTANT
  申请人：Nissan Chemical Industries, Ltd.

  公开号：EP3106921A1

  公开（公告）日：2016-12-21

  There is provided a film with reduced formation of an edge reservoir at a periphery of a film in which the edge reservoir causes an unnecessary residue that cannot be removed by an etching process, and a method for forming the film. A film forming composition for use in a lithography process, the film forming composition comprising a surfactant containing a polymer and an oligomer having a C3-5 perfluoroalkyl partial structure. The perfluoroalkyl partial structure preferably has a carbon number of 4. The perfluoroalkyl partial structure may further include an alkyl partial structure, and the polymer and the oligomer are preferably a (meth)acrylate polymer and a (meth)acrylate oligomer, respectively. The surfactant is contained in an amount of 0.0001% by mass to 1.5% by mass based on the total solid content of the film forming composition. The film forming composition further comprises a coating film resin, and the coating film resin is a novolac resin, a condensation epoxy resin, a (meth)acylic resin, a polyether-based resin, or a silicon-containing resin, etc. The formed film can be used as a resist underlayer film or a resist overlayer film.

  本发明提供了一种可减少在薄膜外围形成边缘储层的薄膜，在这种薄膜中，边缘储层会造成无法通过蚀刻工艺去除的不必要残留物，本发明还提供了一种用于形成该薄膜的方法。一种用于光刻工艺的成膜组合物，该成膜组合物包含一种表面活性剂，其中含有一种聚合物和一种具有 C3-5 全氟烷基部分结构的低聚物。全氟烷基部分结构的碳原子数最好为 4。全氟烷基部分结构可进一步包括烷基部分结构，聚合物和低聚物最好分别为（甲基）丙烯酸酯聚合物和（甲基）丙烯酸酯低聚物。根据成膜组合物的总固体含量，表面活性剂的含量为 0.0001%（质量百分比）至 1.5%（质量百分比）。成膜组合物还包括涂膜树脂，涂膜树脂为酚醛树脂、缩合环氧树脂、（甲基）酰基树脂、聚醚基树脂或含硅树脂等。形成的薄膜可用作抗蚀剂底层薄膜或抗蚀剂覆盖层薄膜。
• RADIATION SENSITIVE COMPOSITION
  申请人：Nissan Chemical Industries, Ltd.

  公开号：EP3309614A1

  公开（公告）日：2018-04-18

  There is provided a radiation sensitive composition including a siloxane polymer exhibiting phenoplast crosslinking reactivity as a base resin, which is excellent in resolution and can be used as a radiation sensitive composition capable of allowing a pattern having a desired-shape to be formed with sufficient precision. A radiation sensitive composition comprising as a silane, a hydrolyzable silane, a hydrolysis product thereof, or a hydrolysis-condensation product thereof; and a photoacid generator, in which the hydrolyzable silane includes hydrolyzable silanes of Formula (1)         R1aR2bSi(R3)4-(a+b)     Formula (1) wherein R1 is an organic group of Formula (1-2) and is bonded to a silicon atom through a Si-C bond or a Si-O bond, and R3 is a hydrolyzable group; and Formula (2)         R7cR8dSi(R9)4-(c+d)     Formula (2) wherein R7 is an organic group of Formula (2-1) , and is bonded to a silicon atom through a Si-C bond or a Si-O bond, and R9 is a hydrolyzable group.

  本发明提供了一种辐射敏感性组合物，该组合物包括一种硅氧烷聚合物，该聚合物作为基础树脂具有酚醛交联反应活性，具有优异的分辨率，可用作辐射敏感性组合物，能够以足够的精度形成具有所需形状的图案。一种辐射敏感性组合物，包括硅烷、可水解硅烷、其水解产物或其水解缩合产物；以及光酸发生器，其中可水解硅烷包括式（1）的可水解硅烷 R1aR2bSi(R3)4-(a+b) 式（1） 其中 R1 是式 (1-2) 的有机基团 并通过 Si-C 键或 Si-O 键与硅原子结合，R3 是可水解基团；以及式（2） R7cR8dSi(R9)4-(c+d) 式（2） 其中 R7 是式 (2-1) 的有机基团 通过 Si-C 键或 Si-O 键与硅原子结合，R9 是可水解基团。
• PHOTOSENSITIVE RESIN COMPOSITION, AND METHOD FOR ETCHING GLASS SUBSTRATE
  申请人：TOKYO OHKA KOGYO CO., LTD.

  公开号：EP3702387A1

  公开（公告）日：2020-09-02

  To provide a photosensitive resin composition capable of forming an etching mask having sufficient resistance to an etchant to be used for etching of a glass substrate, the mask being able to be peeled off by an organic solvent-based stripping liquid, and a method for etching a glass substrate, the method including forming an etching mask using the photosensitive resin composition. For formation of an etching mask at the time of etching a glass substrate, a photosensitive resin composition including a resin component (A) having an acid-dissociable dissolution-inhibiting group and whose solubility in alkali is increased by action of an acid, an acid generator (B) generating an acid by irradiation with radiation, a filler (C), and a plasticizer (D), or a photosensitive resin composition including a resin component (A1) having a phenolic hydroxyl group, a protective agent (A2) to give an acid-dissociable dissolution-inhibiting group by reacting with a phenolic hydroxyl group, the acid generator (B), the filler (C), and the plasticizer (D), is used.

  提供一种光敏树脂组合物，该组合物能够形成对蚀刻液具有足够耐受性的蚀刻掩膜，用于蚀刻玻璃基板，该掩膜能够被有机溶剂型剥离液剥离；还提供一种蚀刻玻璃基板的方法，该方法包括使用该光敏树脂组合物形成蚀刻掩膜。为了在蚀刻玻璃基板时形成蚀刻掩膜，光敏树脂组合物包括具有可酸解的溶解抑制基团且其在碱中的溶解度在酸的作用下会增加的树脂成分 (A)、通过辐射产生酸的酸发生器 (B)、填料 (C) 和光敏树脂组合物、填充剂 (C) 和增塑剂 (D)，或光敏树脂组合物，包括具有酚羟基的树脂成分 (A1)、通过与酚羟基、酸发生器 (B)、填充剂 (C) 和增塑剂 (D) 反应产生可酸解的溶解抑制基的保护剂 (A2)。
• Silicon-containing resist underlayer film-forming composition having organic group having aliphatic polycyclic structure
  申请人：NISSAN CHEMICAL INDUSTRIES, LTD.

  公开号：US10082735B2

  公开（公告）日：2018-09-25

  A resist underlayer film-forming composition for lithography having an aliphatic polycyclic structure including, as a silane, a hydrolyzable silane, a hydrolysis product thereof, a hydrolysis-condensation product thereof, or a combination thereof, in which the aliphatic polycyclic structure is a structure which a hydrolyzable silane of Formula (1): R1aR2bSi(R3)4-(a+b)  Formula (1) (where R1 is an organic group having an aliphatic polycyclic structure and bonded to a Si atom through a Si—C bond; R3 is an ethoxy group; a is an integer of 1; b is an integer of 0 to 2; and a+b is an integer of 1 to 3) has, or a structure included in a compound added as an aliphatic polycyclic compound, an aliphatic polycyclic dicarboxylic acid, or an aliphatic polycyclic dicarboxylic acid anhydride, each optionally having a double bond, a hydroxy group, or an epoxy group.

  一种光刻用抗蚀剂底层成膜组合物，具有脂肪族多环结构，作为硅烷包括可水解硅烷、其水解产物、其水解缩合产物或其组合，其中脂肪族多环结构是式 (1) 可水解硅烷的结构： R1aR2bSi(R3)4-(a+b) 式(1) (其中 R1 是具有脂族多环结构并通过 Si-C 键与 Si 原子结合的有机基团；R3 是乙氧基；a 是 1 的整数；b 是 0 至 2 的整数；和 a+b 为 1 至 3 的整数）具有的结构，或作为脂肪族多环化合物、脂肪族多环二羧酸或脂 肪族多环二羧酸酐添加到化合物中的结构，每个结构可选择具有双键、羟基或环氧基。