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1-Adamantanecarboxylic acid, 2-butyl ester

中文名称
——
中文别名
——
英文名称
1-Adamantanecarboxylic acid, 2-butyl ester
英文别名
butan-2-yl adamantane-1-carboxylate
1-Adamantanecarboxylic acid, 2-butyl ester化学式
CAS
——
化学式
C15H24O2
mdl
——
分子量
236.35
InChiKey
OTFHZSAGXXABSX-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    4
  • 重原子数:
    17
  • 可旋转键数:
    4
  • 环数:
    4.0
  • sp3杂化的碳原子比例:
    0.93
  • 拓扑面积:
    26.3
  • 氢给体数:
    0
  • 氢受体数:
    2

文献信息

  • PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST FILM
    申请人:Enomoto Yuichiro
    公开号:US20120282548A1
    公开(公告)日:2012-11-08
    Provided is a pattern forming method comprising (i) a step of forming a film from an actinic ray-sensitive or radiation-sensitive resin composition, (ii) a step of exposing the film, and (iii) a step of developing the exposed film by using an organic solvent-containing developer, wherein the actinic ray-sensitive or radiation-sensitive resin composition comprises (A) a resin capable of decreasing the solubility for an organic solvent-containing developer by the action of an acid, (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, (D) a solvent, and (G) a compound having at least either one of a fluorine atom and a silicon atom and having basicity or being capable of increasing the basicity by the action of an acid.
    提供的是一种形成图案的方法,包括(i)使用光致或辐射敏感树脂组成物形成薄膜的步骤,(ii)曝光薄膜的步骤,以及(iii)使用有机溶剂含有的显影剂显影曝光后的薄膜的步骤,其中光致或辐射敏感树脂组成物包括(A)一种能够通过酸的作用降低有机溶剂含有的显影剂的溶解度的树脂,(B)一种能够在光致或辐射照射下生成酸的化合物,(D)一种溶剂,以及(G)一种具有原子和原子中的至少一种,并具有碱性或能够通过酸的作用增加碱性的化合物。
  • PRODRUG OF FLUORINE-CONTAINING AMINO ACID
    申请人:TAISHO PHARMACEUTICAL CO., LTD.
    公开号:US20150141669A1
    公开(公告)日:2015-05-21
    Provided are a fluorine-containing amino acid prodrug represented by general formula (I) that makes a fluorine-containing amino acid which is a group 2 metabotropic glutamate receptor agonist into a prodrug, or a pharmaceutically acceptable salt thereof. More specifically, provided is a prodrug that increases the in vivo exposure and enhances the oral absorbability and other mucosal absorbability of a parent compound that acts on group 2 metabotropic glutamate receptors as an agent for the treatment or prevention of diseases in which group 2 metabotropic glutamate receptors are said to be involved, such as: schizophrenia, anxiety disorder and its related diseases, depression, bipolar disorder, epilepsy, developmental disorders, sleep disorders, and other neuropsychiatric diseases; and drug dependence, cognitive disorders, Alzheimer's disease, Huntington's chorea, Parkinson's disease, movement disorders associated with muscular rigidity, cerebral ischemia, cerebral insufficiency, spinal cord disorders, cephalopathy, and other neurological diseases.
    提供了一种含氨基酸前药,其通式表示为(I),可将作为2型代谢性谷酸受体激动剂的含氨基酸制成前药,或其药学上可接受的盐。更具体地,提供了一种前药,可增加在体暴露量并增强口服吸收和其他粘膜吸收,作为治疗或预防2型代谢性谷酸受体参与的疾病的药物,如:精神分裂症,焦虑症及其相关疾病,抑郁症,双相障碍,癫痫,发育障碍,睡眠障碍和其他神经精神疾病;以及药物依赖,认知障碍,阿尔茨海默病,亨廷顿病,帕森病,与肌肉僵硬相关的运动障碍,脑缺血,脑血管不足,脊髓疾病,头痛和其他神经系统疾病。
  • METHOD OF FORMING PATTERN USING ACTINIC-RAY OR RADIATION-SENSITIVE RESIN COMPOSITION, AND PATTERN
    申请人:Enomoto Yuichiro
    公开号:US20120077131A1
    公开(公告)日:2012-03-29
    According to one embodiment, a method of forming a pattern includes the step of applying an actinic-ray- or radiation-sensitive resin composition on a substrate so as to form a film, the step of selectively exposing the film through a mask and the step of developing the exposed film with the use of a developer containing an organic solvent, wherein the actinic-ray- or radiation-sensitive resin composition contains a resin (A) whose polarity is increased by the action of an acid so that the solubility of the resin in the developer containing an organic solvent is decreased, a photoacid generator (B) that when exposed to actinic rays or radiation, generates an acid containing a fluorine atom and a solvent (C), and wherein the photoacid generator (B) is contained in the composition in a ratio of 8 to 20 mass % based on the total solids of the composition.
  • US8911930B2
    申请人:——
    公开号:US8911930B2
    公开(公告)日:2014-12-16
  • US9428483B2
    申请人:——
    公开号:US9428483B2
    公开(公告)日:2016-08-30
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