3-acetoxy-2,2-dimethyl-propionic acid ethyl ester | 70361-68-1

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 羧酸及其衍生物
• 英文名称: 3-acetoxy-2,2-dimethyl-propionic acid ethyl ester
• 英文别名: Acetoxy-pivalinsaeure-aethylester；3-Acetoxy-2,2-dimethyl-propionsaeure-aethylester；Ethyl 3-acetyloxy-2,2-dimethylpropanoate
• CAS: 70361-68-1
• 化学式: C₉H₁₆O₄
• 分子量: 188.224
• InChiKey: LAJIQRJUDVCNFR-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  1.2
• 重原子数：
  13
• 可旋转键数：
  6
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.78
• 拓扑面积：
  52.6
• 氢给体数：
  0
• 氢受体数：
  4

反应信息

• 作为产物：
  描述：

  2,2-二甲基-3-羟基丙酸 在 盐酸 作用下， 生成 3-acetoxy-2,2-dimethyl-propionic acid ethyl ester
  参考文献：
  名称：

  Marcilly, Bulletin de la Societe Chimique de France, 1904, vol. <3>31, p. 129

  摘要：

  DOI：

文献信息

• SALT, PHOTORESIST COMPOSITION, AND METHOD FOR PRODUCING PHOTORESIST PATTERN
  申请人：ANRYU Yukako

  公开号：US20120328986A1

  公开（公告）日：2012-12-27

  A salt represented by formula (I): wherein Q 1 and Q 2 independently each represent a fluorine atom or a C1-C6 perfluoroalkyl group, n represents 0 or 1, L l represents a single bond or a C1-C10 alkanediyl group in which a methylene group may be replaced by an oxygen atom or carbonyl group, provided that L l is not a single bond when n is 0, ring W represents a C3-C36 aliphatic ring in which a methylene group may be replaced by an oxygen atom, a sulfur atom, a carbonyl group or a sulfonyl group and in which a hydrogen atom may be replaced by a hydroxyl group, a C1-C12 alkyl group or a C1-C12 alkoxy group, R l represents a hydroxyl group or a hydroxyl group protected by a protecting group, and Z + represents an organic cation.

  一种用化学式(I)表示的盐：其中Q1和Q2分别表示氟原子或C1-C6全氟烷基基团，n表示0或1，Ll表示单键或C1-C10脂肪二基团，其中一个亚甲基基团可被氧原子或羰基取代，但当n为0时，Ll不是单键，环W表示C3-C36脂肪环，其中一个亚甲基基团可被氧原子、硫原子、羰基或磺酰基取代，氢原子可被氢氧基、C1-C12烷基基团或C1-C12烷氧基取代，Rl表示氢氧基或受保护的氢氧基，Z+表示有机阳离子。
• SALT AND PHOTORESIST COMPOSITION COMPRISING THE SAME
  申请人：ICHIKAWA Koji

  公开号：US20120225385A1

  公开（公告）日：2012-09-06

  The present invention provides a salt represented by the formula (I): wherein Q 1 and Q 2 independently each represent a fluorine atom or a C1-C6 perfluoroalkyl group, L 1 represents a C1-C17 divalent saturated hydrocarbon group in which one or more —CH 2 — can be replaced by —O— or —CO—, L 2 represents a single bond or a C1-C6 alkanediyl group in which one or more —CH 2 — can be replaced by —O— or —CO—, Y represents a C3-C18 alicyclic hydrocarbon group which can have one or more substituents, and one or more —CH 2 — in the alicyclic hydrocarbon group can be replaced by —O—, —CO— or —SO 2 —, and Z + represents an organic counter ion.
• SALT, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
  申请人：YAMAGUCHI Satoshi

  公开号：US20120231392A1

  公开（公告）日：2012-09-13

  A salt represented by the formula (I) and a resist composition containing the salt are provided, wherein Q 1 , Q 2 , L 1 , ring W 1 , R e1 , R e2 , R e3 , R e4 , R e5 , R e6 , R e7 , R e8 , R e9 , R e10 , R e11 , R e12 , R e13 and Z are defined in the specification.
• US8557500B2
  申请人：——

  公开号：US8557500B2

  公开（公告）日：2013-10-15
• US8921028B2
  申请人：——

  公开号：US8921028B2

  公开（公告）日：2014-12-30