[6-[2-(2-Ethoxyethoxy)ethylsulfanyl]-1,3-dioxobenzo[de]isoquinolin-2-yl] 4-methylbenzenesulfonate | 1315380-37-0

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 异喹啉及其衍生物
• 英文名称: [6-[2-(2-Ethoxyethoxy)ethylsulfanyl]-1,3-dioxobenzo[de]isoquinolin-2-yl] 4-methylbenzenesulfonate
• 英文别名: [6-[2-(2-ethoxyethoxy)ethylsulfanyl]-1,3-dioxobenzo[de]isoquinolin-2-yl] 4-methylbenzenesulfonate
• CAS: 1315380-37-0
• 化学式: C₂₅H₂₅NO₇S₂
• 分子量: 515.608
• InChiKey: RXVXMBCNLMFQMV-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  4.3
• 重原子数：
  35
• 可旋转键数：
  11
• 环数：
  4.0
• sp3杂化的碳原子比例：
  0.28
• 拓扑面积：
  133
• 氢给体数：
  0
• 氢受体数：
  8

反应信息

• 作为产物：
  描述：

  6-[(2-羟乙基)硫代]-1H,3H-萘[1,8-CD]吡喃-1,3-二酮 在 盐酸羟胺 、 sodium methylate 、 三乙胺 、 sodium hydroxide 作用下， 以 四氢呋喃 、 水 、 二甲基亚砜 、 N,N-二甲基甲酰胺 为溶剂， 反应 3.0h， 生成 [6-[2-(2-Ethoxyethoxy)ethylsulfanyl]-1,3-dioxobenzo[de]isoquinolin-2-yl] 4-methylbenzenesulfonate
  参考文献：
  名称：

  NOVEL SULFONIC ACID DERIVATIVE COMPOUND AND NOVEL NAPHTHALIC ACID DERIVATIVE COMPOUND

  摘要：

  揭示了一种新颖的磺酸衍生物化合物和一种新颖的萘甲酸衍生物化合物，具有在有机溶剂中高溶解度、良好的光敏性，并适用于光酸发生剂和聚合引发剂。磺酸衍生物化合物由以下式(I)表示（其中R01、R04、R05和R06代表氢原子；R02和R03中的任一表示具有4至18个碳原子的烷氧基，可以被取代为脂环烃基、杂环基或卤素原子，并且可以具有支链等；R07表示具有1至18个碳原子的脂肪烃基，可以被取代为卤素原子和/或烷基硫基等）。

  公开号：

  US20120289697A1

文献信息

• Hydrogen barrier agent, hydrogen barrier film forming composition, hydrogen barrier film, method for producing hydrogen barrier film, and electronic element
  申请人：TOKYO OHKA KOGYO CO., LTD.

  公开号：US10023540B2

  公开（公告）日：2018-07-17

  To provide a hydrogen barrier agent capable of imparting hydrogen barrier performance to various materials; a hydrogen barrier film forming composition including the hydrogen barrier agent; a hydrogen barrier film including the hydrogen barrier agent; a method for producing a hydrogen barrier film, which uses the hydrogen barrier film forming composition; and an electronic element provided with the hydrogen barrier film. A compound having a specific structure including an imidazolyl group is used as the hydrogen barrier agent. Furthermore, the hydrogen barrier film forming composition is prepared by blending the above-mentioned hydrogen barrier agent into the base material component. In addition, the hydrogen barrier film is formed using the hydrogen barrier film forming composition.

  提供一种能使各种材料具有氢阻隔性能的氢阻隔剂；一种包括该氢阻隔剂的氢阻隔薄膜形成组合物；一种包括该氢阻隔剂的氢阻隔薄膜；一种使用该氢阻隔薄膜形成组合物生产氢阻隔薄膜的方法；以及一种带有该氢阻隔薄膜的电子元件。氢阻隔剂使用了一种具有特定结构的化合物，其中包括咪唑基团。此外，氢阻隔膜形成组合物是通过将上述氢阻隔剂与基础材料成分混合而制备的。此外，使用氢阻隔膜形成组合物形成氢阻隔膜。
• Photosensitive resin composition, method for producing cured film, cured film, liquid crystal display device, organic electroluminescent display device, and touch panel
  申请人：FUJIFILM Corporation

  公开号：US10254645B2

  公开（公告）日：2019-04-09

  There are provided a photosensitive resin composition having excellent chemical resistance, light resistance, and solubility in a solvent, a method for producing a cured film, a cured film, a liquid crystal display device, an organic electroluminescent display device, and a touch panel. The photosensitive resin composition contains a polybenzoxazole precursor, a photoacid generator which generates an acid having a pKa of 3 or less or a quinone diazide compound, and a solvent, in which the polybenzoxazole precursor contains a total of 70 mol % or more of a repeating unit represented by the following Formula (1) and a repeating unit represented by the following Formula (2) with respect to the total repeating units, and a ratio between the repeating unit represented by Formula (1) and the repeating unit represented by Formula (2) is 9:1 to 3:7 in a molar ratio. Y1 represents a cyclic aliphatic group having 3 to 15 carbon atoms, and Y2 represents a linear or branched aliphatic group having 4 to 20 carbon atoms.

  本发明提供了一种具有优异耐化学性、耐光性和在溶剂中溶解性的光敏树脂组合物、一种生产固化膜的方法、一种固化膜、一种液晶显示装置、一种有机电致发光显示装置和一种触摸屏。光敏树脂组合物包含聚苯并恶唑前体、产生 pKa 为 3 或以下的酸或重氮化醌化合物的光酸发生器和溶剂、其中，聚苯并恶唑前体包含的下式(1)和下式(2)所代表的重复单元的总量占重复单元总量的 70 摩尔%或以上，且下式(1)和下式(2)所代表的重复单元的比例为 9：1 至 3:7 的摩尔比。Y1 代表具有 3 至 15 个碳原子的环状脂肪族基团，Y2 代表具有 4 至 20 个碳原子的直链或支链脂肪族基团。
• PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING CURED FILM, CURED FILM, LIQUID CRYSTAL DISPLAY DEVICE, ORGANIC ELECTROLUMINESCENT DISPLAY DEVICE, AND TOUCH PANEL
  申请人：FUJIFILM Corporation

  公开号：US20170168391A1

  公开（公告）日：2017-06-15

  There are provided a photosensitive resin composition having excellent chemical resistance, light resistance, and solubility in a solvent, a method for producing a cured film, a cured film, a liquid crystal display device, an organic electroluminescent display device, and a touch panel. The photosensitive resin composition contains a polybenzoxazole precursor, a photoacid generator which generates an acid having a pKa of 3 or less or a quinone diazide compound, and a solvent, in which the polybenzoxazole precursor contains a total of 70 mol % or more of a repeating unit represented by the following Formula (1) and a repeating unit represented by the following Formula (2) with respect to the total repeating units, and a ratio between the repeating unit represented by Formula (1) and the repeating unit represented by Formula (2) is 9:1 to 3:7 in a molar ratio. Y 1 represents a cyclic aliphatic group having 3 to 15 carbon atoms, and Y 2 represents a linear or branched aliphatic group having 4 to 20 carbon atoms.
• HYDROGEN BARRIER AGENT, HYDROGEN BARRIER FILM FORMING COMPOSITION, HYDROGEN BARRIER FILM, METHOD FOR PRODUCING HYDROGEN BARRIER FILM, AND ELECTRONIC ELEMENT
  申请人：TOKYO OHKA KOGYO CO., LTD.

  公开号：US20180086717A1

  公开（公告）日：2018-03-29

  To provide a hydrogen barrier agent capable of imparting hydrogen barrier performance to various materials; a hydrogen barrier film forming composition including the hydrogen barrier agent; a hydrogen barrier film including the hydrogen barrier agent; a method for producing a hydrogen barrier film, which uses the hydrogen barrier film forming composition; and an electronic element provided with the hydrogen barrier film. A compound having a specific structure including an imidazolyl group is used as the hydrogen barrier agent. Furthermore, the hydrogen barrier film forming composition is prepared by blending the above-mentioned hydrogen barrier agent into the base material component. In addition, the hydrogen barrier film is formed using the hydrogen barrier film forming composition.
• US8680268B2
  申请人：——

  公开号：US8680268B2

  公开（公告）日：2014-03-25