This specification discloses bridging graphene material elements that provide antibacterial capabilities. Elements that can include a support structure are described. Elements that can be items to be protected from microorganisms by the support structure are also described. Methods for killing microorganisms or preventing microbial contamination by applying the above antibacterial elements and related devices are also described.【Selected figure】Figure 1
[EN] PHOTOALIGNING MATERIAL<br/>[FR] MATÉRIAU DE PHOTOALIGNEMENT
申请人:ROLIC AG
公开号:WO2013017467A1
公开(公告)日:2013-02-07
The present invention relates to a copolymer for the photoalignment of liquid crystals comprising a photoreactive group as given below in formula (I), compositions thereof, and its use for optical and electro optical devices, especially liquid crystal devices (LCDs).
The present invention relates to photoreactive compounds that are particularly useful in materials for the alignment of liquid crystals.
本发明涉及光反应性化合物,特别适用于液晶对准材料的制作。
PHOTOALIGNING MATERIAL
申请人:Eckert Jean-Francois
公开号:US20130035446A1
公开(公告)日:2013-02-07
The present invention relates to polymer, homo- or copolymer or oligomer for the photoalignment of liquid crystals comprising a main chain and a side chain, wherein the side chain comprises a difluoromethylene group, compositions thereof, and its use for optical and electro optical devices, especially liquid crystal devices (LCDs).
The present invention relates to photoaligning material with lateral substitution, compositions thereof, and its use for optical and electro optical devices, especially liquid crystal devices (LCDs).
PHOTOSENSITIVE RESIN COMPOSITION, POLYAMIDE RESIN, METHOD FOR PRODUCING POLYAMIDE RESIN, COMPOUND, METHOD FOR PRODUCING COMPOUND, METHOD FOR PRODUCING CURED FILM, AND CURED FILM
申请人:TOKYO OHKA KOGYO CO., LTD.
公开号:US20180107114A1
公开(公告)日:2018-04-19
A photosensitive resin composition capable of forming a cured film with satisfactory adhesion to substrates and excellent transparency, a polyamide resin which is used in the photosensitive resin composition, a method for producing the polyamide resin, a compound which is used as a raw material of the polyamide resin, a method for producing the compound, a method for producing a cured film using the photosensitive resin composition, and a cured film which is obtained by curing the photosensitive resin composition. The photosensitive resin composition including a resin and a photopolymerization initiator. The resin is a polyamide resin including a structural unit, which includes a specific saturated alicyclic skeleton, and at least one carboxy group esterified by a unit containing a polymerizable group of a predetermined structure.