申请人:H. LUNDBECK A/S
公开号:EP0271225A2
公开(公告)日:1988-06-15
Indene derivatives of the general formula
wherein R¹ is
a) a phenyl group optionally substituted with one or more groups selected from halogen, lower alkyl, lower alkoxy, lower alkylthio, lower alkylsulfonyl, dilower alkylamino, acylamino such as acetylamino, cyano, trifluoromethyl, trifluoromethoxy, pyrrole and dilower alkylpyrrole,
b) a polycyclic aromatic or heteroaromatic group, such as naphthalene or quinoline,
c) a heteroaromatic group such as thiophene, pyridine and pyrrole, optionally substituted with one or more groups selected from halogen, lower alkyl, lower alkoxy, lower alkylthio, trifluoromethyl or trifluoromethoxy,
R² is selected from H, halogen , lower alkyl, benzyl, lower alkylthio, lower alkylsulfonyl, dilower alkylsulfamoyl, acylamino such as acetylamino, benzylamino, dilower alkylamino, cyano, pyrrole, dilower alkylpyrrole, trifluoromethyl and trifluoromethoxy,
R³ is CN, COOR⁴, -CON(R⁴)₂ or COR⁴, where R⁴ is a lower alkyl group, and "n" is an integer of from 1 - 3 inclusive. The compounds are valuable intermediates in the preparation of pharmacologically active indane and indene derivatives.
Methods are also described.
通式如下的茚衍生物
其中 R¹ 是
a) 可任选被一个或多个基团取代的苯基,这些基团选自卤素、低级烷基、低级烷氧基、低级烷硫基、低级烷磺基、稀释烷基氨基、酰氨基(如乙酰氨基)、氰基、三氟甲基、三氟甲氧基、吡咯和稀释烷基吡咯、
b) 多环芳香族或杂芳族基团,如萘或喹啉、
c) 杂芳香族基团,如噻吩、吡啶和吡咯,可选择被一个或多个基团取代,这些基团选自卤素、低级烷基、低级烷氧基、低级烷硫基、三氟甲基或三氟甲氧基、
R² 选自 H、卤素、低级烷基、苄基、低级烷硫基、低级烷基磺酰基、稀释烷基氨基磺酰基、酰氨基如乙酰氨基、苄基氨基、稀释烷基氨基、氰基、吡咯、稀释烷基吡咯、三氟甲基和三氟甲氧基、
R³ 是 CN、COOR⁴、-CON(R⁴)₂ 或 COR⁴,其中 R⁴ 是低级烷基,"n "是 1-3 的整数。这些化合物是制备具有药理活性的茚和茚衍生物的重要中间体。
本文还介绍了制备方法。