2-(3-Bicyclo[5.2.1]decanyl)-1,1-difluoroethanesulfonic acid

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 有机磺酸及其衍生物
• 英文名称: 2-(3-Bicyclo[5.2.1]decanyl)-1,1-difluoroethanesulfonic acid
• 英文别名: 2-(3-bicyclo[5.2.1]decanyl)-1,1-difluoroethanesulfonic acid
• 化学式: C₁₂H₂₀F₂O₃S
• 分子量: 282.35
• InChiKey: GRXTZVXSTWGHDI-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  4.3
• 重原子数：
  18
• 可旋转键数：
  3
• 环数：
  2.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  62.8
• 氢给体数：
  1
• 氢受体数：
  5

文献信息

• [EN] METHOD OF FORMING PATTERN AND ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION FOR USE IN THE METHOD<br/>[FR] PROCÉDÉ DE FORMATION DE MOTIF ET COMPOSITION DE RÉSINE SENSIBLE À UN RAYONNEMENT OU AUX RAYONS ACTINIQUES POUR UTILISATION DANS LE PROCÉDÉ
  申请人：FUJIFILM CORP

  公开号：WO2014007361A1

  公开（公告）日：2014-01-09

  Provided is a method of forming a pattern, including (a) forming a film comprising an actinic-ray- or radiation-sensitive resin composition comprising a resin (P) containing a repeating unit (P1) with a cyclic carbonic acid ester structure and any of repeating units (P2) of general formula (P2-1) below, and a compound (B) that when exposed to actinic rays or radiation, generates an acid, (b) exposing the film to actinic rays or radiation, and (c) developing the exposed film with a developer comprising an organic solvent to thereby obtain a negative pattern.