2,2,3,3,4,4,5,5,6,6,6-Undecafluorohexyl bicyclo[2.2.1]hept-5-ene-2-carboxylate

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 羧酸及其衍生物
• 英文名称: 2,2,3,3,4,4,5,5,6,6,6-Undecafluorohexyl bicyclo[2.2.1]hept-5-ene-2-carboxylate
• 英文别名: 2,2,3,3,4,4,5,5,6,6,6-undecafluorohexyl bicyclo[2.2.1]hept-5-ene-2-carboxylate
• 化学式: C₁₄H₁₁F₁₁O₂
• 分子量: 420.22
• InChiKey: OYWXASZGNXLYCT-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  5.3
• 重原子数：
  27
• 可旋转键数：
  7
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.79
• 拓扑面积：
  26.3
• 氢给体数：
  0
• 氢受体数：
  13

文献信息

• Fluorine free photopatternable phenol functional group containing polymer compositions
  申请人：PROMERUS, LLC

  公开号：US10054854B2

  公开（公告）日：2018-08-21

  Various polycycloolefinic polymers containing phenolic pendent groups and compositions thereof useful for forming self-imageable films encompassing such polymers are disclosed. Such polymers encompass norbornene-type repeating units containing phenolic pendent groups which contain very low levels of fluorine containing monomers. The films formed from such polymer compositions provide self imageable, low-k, thermally stable layers for use in microelectronic and optoelectronic devices.

  本发明公开了各种含酚醛悬垂基团的聚环烯烃聚合物及其用于形成包含此类聚合物的自成像薄膜的组合物。此类聚合物包含降冰片烯类重复单元，其中含有含氟单体含量极低的酚醛悬垂基团。由此类聚合物组合物形成的薄膜具有自成像、低 K 值、热稳定的特性，可用于微电子和光电设备。
• Permanent dielectric compositions containing photoacid generator and base
  申请人：PROMERUS, LLC

  公开号：US10429734B2

  公开（公告）日：2019-10-01

  Embodiments encompassing a series of compositions containing photoacid generator (PAG) and a base are disclosed and claimed. The compositions are useful as permanent dielectric materials. More specifically, embodiments encompassing compositions containing a series of copolymers of a variety of norbornene-type cycloolefinic monomers and maleic anhydride in which maleic anhydride is fully or partially hydrolyzed (i.e., ring opened and fully or partially esterified), PAG and a base, which are useful in forming permanent dielectric materials having utility in a variety of electronic material applications, among various other uses, are disclosed.

  本发明公开了一系列包含光酸发生器（PAG）和基质的组合物，并提出了权利要求。这些组合物可用作永久介电材料。更具体地说，本发明公开了包含多种降冰片烯类环烯烃单体和马来酸酐的一系列共聚物（其中马来酸酐完全或部分水解（即开环和完全或部分酯化））、PAG 和碱的组合物的实施方案，这些组合物可用于形成在各种电子材料应用中有用的永久介电材料。
• Nadic anhydride polymers and photosensitive compositions derived therefrom
  申请人：PROMERUS, LLC

  公开号：US10591818B2

  公开（公告）日：2020-03-17

  Various vinyl addition polymers of nadic anhydride are disclosed. Examples of such polymers include copolymers and terpolymers of nadic anhydride with a wide variety of norbornene-type monomers. The nadic anhydride polymers are found to be useful in forming a wide variety of photosensitive compositions, both positive and negative, which are capable of forming high resolution imagable films exhibiting excellent dielectric properties (low-k) and thermal properties, and thus are useful in the fabrication of a variety of microelectronic and optoelectronic devices, among others.

  本文公开了纳丁酸酐的各种乙烯基加成聚合物。此类聚合物的例子包括纳丁酸酐与各种降冰片烯类单体的共聚物和三元共聚物。我们发现萘酸酐聚合物可用于形成各种光敏组合物，包括正性和负性组合物，这些组合物能够形成高分辨率的可成像薄膜，表现出优异的介电性能（低 K 值）和热性能，因此可用于制造各种微电子和光电设备等。
• MALEIMIDE CONTAINING CYCLOOLEFINIC POLYMERS AND APPLICATIONS THEREOF
  申请人：Promerus, LLC

  公开号：US20140087293A1

  公开（公告）日：2014-03-27

  Various cycloolefinic/maleic anhydride polymers containing maleimide pendant groups and compositions thereof useful for forming self-imageable films encompassing such copolymers are disclosed. Such polymers encompass norbornene-type repeating units containing maleimide groups and maleic anhydride-type repeating units where at least some of such maleic anhydride-type repeating units have been ring-opened. The films formed from such copolymer compositions provide self imageable, low-k, thermally stable layers for use in microelectronic and optoelectronic devices.
• FLUORINE FREE PHOTOPATTERNABLE PHENOL FUNCTIONAL GROUP CONTAINING POLYMER COMPOSITIONS
  申请人：PROMERUS, LLC

  公开号：US20170097566A1

  公开（公告）日：2017-04-06

  Various polycycloolefinic polymers containing phenolic pendent groups and compositions thereof useful for forming self-imageable films encompassing such polymers are disclosed. Such polymers encompass norbornene-type repeating units containing phenolic pendent groups which contain very low levels of fluorine containing monomers. The films formed from such polymer compositions provide self imageable, low-k, thermally stable layers for use in microelectronic and optoelectronic devices.