申请人:HITACHI CHEMICAL COMPANY, LTD.
公开号:US20150232704A1
公开(公告)日:2015-08-20
A polishing agent according to one embodiment of the present invention contains a liquid medium, an abrasive grain including a hydroxide of a tetravalent metal element, a polymer compound having an aromatic ring and a polyoxyalkylene chain, and a cationic polymer, wherein a weight average molecular weight of the polymer compound is 1000 or more.