[8-(Methoxymethyl)-2-tricyclo[3.2.1.02,4]oct-6-enyl] 2-methylprop-2-enoate

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 羧酸及其衍生物
• 英文名称: [8-(Methoxymethyl)-2-tricyclo[3.2.1.02,4]oct-6-enyl] 2-methylprop-2-enoate
• 英文别名: [8-(methoxymethyl)-2-tricyclo[3.2.1.02,4]oct-6-enyl] 2-methylprop-2-enoate
• 化学式: C₁₄H₁₈O₃
• 分子量: 234.29
• InChiKey: BZJBIAGUSCWJGO-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2
• 重原子数：
  17
• 可旋转键数：
  5
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.64
• 拓扑面积：
  35.5
• 氢给体数：
  0
• 氢受体数：
  3

文献信息

• RESIST COMPOSITION, PATTERNING PROCESS AND POLYMER
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20140178820A1

  公开（公告）日：2014-06-26

  An additive polymer comprising recurring styrene units having an ester group bonded to a CF 3 —C(OR 2 )—R 3 group (wherein R 2 is H, acyl or acid labile group, R 3 is H, CH 3 or CF 3 ) such as 1,1,1,3,3,3-hexafluoro-2-propanol is added to a polymer capable of increasing alkali solubility under the action of acid to formulate a resist composition. The resist composition can minimize outgassing from a resist film during the EUV lithography and form a resist film having a hydrophilic surface sufficient to prevent formation of blob defects on the film after development.
• POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：US20150253666A1

  公开（公告）日：2015-09-10

  A positive resist composition is provided comprising a polymer comprising recurring units having a carboxyl or phenolic hydroxyl group substituted with an acid labile group and recurring units of 4-pyrone ester, and having a Mw of 1,000-500,000. The resist composition has a satisfactory effect of suppressing acid diffusion and a high resolution, and forms a pattern of good profile and minimal edge roughness after exposure.
• POLYMER, RESIST COMPOSITION, AND PATTERN FORMING PROCESS
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20160168296A1

  公开（公告）日：2016-06-16

  A polymer comprising recurring units having an acid generator bound to the backbone, and recurring units having an optionally acid labile group-substituted carboxyl group and/or recurring units having an optionally acid labile group-substituted hydroxyl group is obtained by polymerizing corresponding monomers under such illumination that the quantity of light of wavelength up to 400 nm is up to 0.05 mW/cm 2 . The polymer avoids photo-decomposition of the acid generator during polymerization and concomitant deprotection reaction of the acid labile group when used in positive resist compositions. A pattern with high dissolution contrast and rectangularity is formed after development.
• US8703408B2
  申请人：——

  公开号：US8703408B2

  公开（公告）日：2014-04-22
• US9040223B2
  申请人：——

  公开号：US9040223B2

  公开（公告）日：2015-05-26