2-(Trifluoromethylsulfonylamino)ethyl 2-oxopropanoate

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 酮酸及其衍生物
• 英文名称: 2-(Trifluoromethylsulfonylamino)ethyl 2-oxopropanoate
• 英文别名: 2-(trifluoromethylsulfonylamino)ethyl 2-oxopropanoate
• 化学式: C₆H₈F₃NO₅S
• 分子量: 263.19
• InChiKey: LNRUXZUUXQZFBY-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  0.3
• 重原子数：
  16
• 可旋转键数：
  6
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.67
• 拓扑面积：
  97.9
• 氢给体数：
  1
• 氢受体数：
  9

文献信息

• RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND POLYMER COMPOUND
  申请人：TOKYO OHKA KOGYO CO., LTD.

  公开号：US20180024433A1

  公开（公告）日：2018-01-25

  A resist composition which generates an acid upon exposure and whose solubility on a developing solution changes under the action of the acid, including a polymer compound having units represented by formulas (a0-1), (a0-2), and (a0-3) in an amount of 0 to 10 mol %. In the formulas, R is a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms, Va 01 and Va 03 are a divalent hydrocarbon group, n a01 and n a03 each are an integer of 0 to 2, Ra 0 ″ is a specific acid dissociable group, Va 02 is a divalent linking group containing a hetero atom or a single bond, Ra 07 is a monovalent organic group, n a021 is an integer of 0 to 3, and n a022 is an integer of 1 to 3.
• RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
  申请人：TOKYO OHKA KOGYO CO., LTD.

  公开号：US20210165324A1

  公开（公告）日：2021-06-03

  A resist composition containing: a base material component exhibiting changed solubility in a developing solution under action of acid; an acid generator component generating an acid upon exposure; and a photodegradable base controlling diffusion of the acid generated from the acid generator component upon exposure, in which the photodegradable base contains a compound represented by General Formula (d0), in which R 011 represents an aryl group having an electron-withdrawing group, R 021 and R 022 each independently represent an aryl group which may have a substituent, Z represents a sulfur atom, an oxygen atom, a carbonyl group, or a single bond, and X − represents a counter anion
• US9134617B2
  申请人：——

  公开号：US9134617B2

  公开（公告）日：2015-09-15
• US9618845B2
  申请人：——

  公开号：US9618845B2

  公开（公告）日：2017-04-11