2-(2,2-Difluoroacetyl)oxyethyl 2,2-dimethylpropanoate

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 羧酸及其衍生物
• 英文名称: 2-(2,2-Difluoroacetyl)oxyethyl 2,2-dimethylpropanoate
• 英文别名: 2-(2,2-difluoroacetyl)oxyethyl 2,2-dimethylpropanoate
• 化学式: C₉H₁₄F₂O₄
• 分子量: 224.2
• InChiKey: DLWUDZMWMRSURG-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.3
• 重原子数：
  15
• 可旋转键数：
  7
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.78
• 拓扑面积：
  52.6
• 氢给体数：
  0
• 氢受体数：
  6

文献信息

• SALT, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
  申请人：SUMITOMO CHEMICAL COMPANY, LIMITED

  公开号：US20160052877A1

  公开（公告）日：2016-02-25

  A salt represented by the formula (I); wherein Q 1 and Q 2 each independently represent a fluorine atom or a C 1 to C 6 perfluoroalkyl group, L b1 represents a single bond or a divalent C 1 to C 24 saturated hydrocarbon groupwhere a methylene group may be replaced by an oxygen atom or a carbonyl group and where a hydrogen atom may be replaced by a hydroxyl group or a fluorine atom, and Y represents a hydrogen atom, a fluorine atom, or an optionally substituted C 3 to C 18 alicyclic hydrocarbon groupwhere a methylene group may be replaced by an oxygen atom, a carbonyl group or a sulfonyl group; and Ar represents a divalent C 6 to C 20 aromatic hydrocarbon group, and Z + represents an organic sulfonium cation or an organic iodonium cation.

  根据您的要求，以下是化合物的中文翻译： 由公式(I)表示的盐； 其中Q1和Q2各自独立代表一个氟原子或一个C1至C6的过氟代烷基团，Lb1代表一个单键或一个二价的C1至C24的饱和烃基团，其中甲基烯基团可以被一个氧原子或一个羰基团所取代，并且其中氢原子可以被一个羟基或一个氟原子所取代，并且Y代表一个氢原子，一个氟原子，或一个可选地被取代的C3至C18的芳环烃基团，其中甲基烯基团可以被一个氧原子，一个羰基团或一个磺酰基团所取代；并且Ar代表一个二价的C6至C20的芳香烃基团，以及Z+代表一个有机硫正离子或一个有机碘正离子。
• COMPOUND, RESIN AND PHOTORESIST COMPOSITION
  申请人：SUMITOMO CHEMICAL COMPANY, LIMITED

  公开号：US20160244400A1

  公开（公告）日：2016-08-25

  A compound represented by formula (I): wherein R 1 represents a hydrogen atom, a halogen atom or a C1-C6 alkyl group where a hydrogen atom can be replaced by a halogen atom, L 1 represents a C1-C8 fluorinated alkanediyl group, X 1 represents *—CO—O—, *—O—CO—, *—O—CO—O— or *—O— where * represents a binding site to L 1 , and R 2 represents a C1-C18 hydrocarbon group in which a methylene group can be replaced by an oxygen atom, a carbonyl group or a sulfonyl group and in which a hydrogen atom can be replaced by a hydroxy group, or in which two hydrogen atoms can be each replaced by an oxygen atom forming one ketal structure together with a C1-C8 alkanediyl group bonded to the oxygen atom and a hydrogen atom in said ketal structure can be replaced by a fluorine atom.

  化合物的化学式（I）表示如下： 其中，R1代表氢原子、卤素原子或C1-C6烷基，其中氢原子可以被卤素原子取代，L1代表C1-C8氟代烷二基基团，X1代表*—CO—O—、*—O—CO—、*—O—CO—O—或*—O—，其中*代表与L1结合位点，R2代表C1-C18烃基团，其中亚甲基基团可以被氧原子、羰基团或磺酰基团取代，其中氢原子可以被羟基取代，或其中两个氢原子可以分别被氧原子取代，与氧原子结合形成一个与氧原子结合的C1-C8烷二基基团一起形成一个缩醛结构，所述缩醛结构中的氢原子可以被氟原子取代。
• COMPOUND, RESIN, PHOTORESIST COMPOSITION, AND METHOD FOR PRODUCING PHOTORESIST PATTERN
  申请人：SUMITOMO CHEMICAL COMPANY, LIMITED

  公开号：US20150064622A1

  公开（公告）日：2015-03-05

  A compound represented by formula (I): wherein R 1 represents a hydrogen atom, a halogen atom, or a C1-C6 alkyl group which may have a halogen atom; R 2 and R 3 each independently represent a hydrogen atom or a C1-C6 monovalent saturated hydrocarbon group, and R 4 represents a C1-C6 monovalent saturated linear hydrocarbon group, a C3-C6 monovalent saturated branched hydrocarbon group, a C5-C12 monovalent alicyclic hydrocarbon group or a C5-C12 monovalent alicyclic hydrocarbon-containing group, or R 3 and R 4 represent a C2-C6 heterocyclic ring together with an oxygen atom and a carbon atom; A 1 represents a single bond, or *-A 2 -X 1 -(A 3 -X 2 ) a — where A 2 and A 3 each independently represent a C1-C6 alkanediyl group, X 1 and X 2 each independently represent an oxygen atom, a carbonyloxy group or an oxycarbonyl group, and “a” represents 0 or 1; A 4 represents a C1-C6 alkanediyl group; Ad represents a divalent adamantanediyl group.
• SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
  申请人：SUMITOMO CHEMICAL COMPANY, LIMITED

  公开号：US20160062233A1

  公开（公告）日：2016-03-03

  A salt having a group represented by formula (a): wherein X a and X b each independently represent an oxygen atom or a sulfur atom, X 1 represents a divalent group having an alicyclic hydrocarbon group where a methylene group may be replaced by an oxygen atom or a carbonyl group, and where a hydrogen atom may be replaced by a hydroxy group or a fluorine atom, and * represents a binding site.
• COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
  申请人：SUMITOMO CHEMICAL COMPANY, LIMITED

  公开号：US20160131971A1

  公开（公告）日：2016-05-12

  A resist composition includes (A1) a resin having an acid-labile group, (A2) a resin which includes a structural unit represented by formula (I), and an acid generator: wherein R 1 represents a hydrogen atom, a halogen atom or a C 1 to C 6 alkyl group in which a hydrogen atom can be replaced by a halogen atom, R 2 represents a C 1 to C 12 fluorinated saturated hydrocarbon group, A 1 represents a C 2 to C 6 alkanediyl group or *-A 2 -X 1 -(A 3 -X 2 ) a -A 4 b -, * represents a binding site to an oxygen atom in —O—CO—, A 2 , A 3 and A 4 each independently represent a C 1 to C 6 alkanediyl group, X 1 and X 2 each independently represent —O—, —CO—O— or —O—CO—, and “a” represents 0 or 1.