RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYMER AND POLYMERIZABLE COMPOUND
申请人:JSR Corporation
公开号:US20160179003A1
公开(公告)日:2016-06-23
A radiation-sensitive resin composition includes a first polymer including an acid-labile group, an acid generator to generate an acid upon exposure to radiation, and a second polymer including a fluorine atom and a functional group shown by a general formula (x). The second polymer has a fluorine atom content higher than a fluorine atom content of the first polymer. R
1
represents an alkali-labile group. A represents an oxygen atom, —NR′—, —CO—O—
#
or —SO
2
—O—
##
, wherein the oxygen atom represented by A is not an oxygen atom bonded directly to an aromatic ring, a carbonyl group, or a sulfoxyl group, R′ represents a hydrogen atom or an alkali-labile group, and “#” and “##” each indicate a bonding hand bonded to R
1
.
-A-R
1
(x)
一种辐射敏感的树脂组合物,包括第一聚合物,其中包括酸敏感基团,酸发生剂用于在辐射照射下生成酸,以及第二聚合物,其中包括氟原子和通过通用公式(x)所示的功能基团。第二聚合物的氟原子含量高于第一聚合物的氟原子含量。R1代表碱解基团。A代表氧原子,-NR′-,-CO-O-#或-SO2-O-##,其中由A表示的氧原子不是直接与芳香环,羰基团或亚砜基团结合的氧原子,R′代表氢原子或碱解基团,“#”和“##”分别表示与R1结合的键手。-A-R1(x)