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(5-Butan-2-yloxy-3-methylheptan-3-yl) 2,2-dimethylbutanoate

中文名称
——
中文别名
——
英文名称
(5-Butan-2-yloxy-3-methylheptan-3-yl) 2,2-dimethylbutanoate
英文别名
(5-butan-2-yloxy-3-methylheptan-3-yl) 2,2-dimethylbutanoate
(5-Butan-2-yloxy-3-methylheptan-3-yl) 2,2-dimethylbutanoate化学式
CAS
——
化学式
C18H36O3
mdl
——
分子量
300.5
InChiKey
QPZLBFMUTAJSOB-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    5.5
  • 重原子数:
    21
  • 可旋转键数:
    11
  • 环数:
    0.0
  • sp3杂化的碳原子比例:
    0.94
  • 拓扑面积:
    35.5
  • 氢给体数:
    0
  • 氢受体数:
    3

文献信息

  • PATTERN FORMING METHOD, ETCHING METHOD AND METHOD FOR PRODUCING CAPACITANCE-TYPE INPUT DEVICE
    申请人:FUJIFILM Corporation
    公开号:US20170199458A1
    公开(公告)日:2017-07-13
    A pattern forming method includes forming a photosensitive resin composition layer on at least one surface of a substrate using a photosensitive transfer material, exposing the photosensitive resin composition layer; and developing the exposed photosensitive resin composition layer, in which the photosensitive transfer material includes a support, a thermoplastic resin layer, and a photosensitive resin composition layer in this order, and the photosensitive resin composition layer includes a polymer component (A) including a polymer having a constituent unit (a1) that includes a group in which an acid group is protected by an acid-decomposable group and a photoacid generator (B).
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