2-Ethyl-2,4-dimethyl-4-(trifluoromethyl)hexanoic acid

• 分子结构分类: 有机化合物 - 脂质和类脂质分子 - 脂肪酰基
• 英文名称: 2-Ethyl-2,4-dimethyl-4-(trifluoromethyl)hexanoic acid
• 英文别名: 2-ethyl-2,4-dimethyl-4-(trifluoromethyl)hexanoic acid
• 化学式: C₁₁H₁₉F₃O₂
• 分子量: 240.26
• InChiKey: QITVZAXOKUHELA-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  4
• 重原子数：
  16
• 可旋转键数：
  5
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.91
• 拓扑面积：
  37.3
• 氢给体数：
  1
• 氢受体数：
  5

文献信息

• RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, ACID GENERATOR AND COMPOUND
  申请人：TOKYO OHKA KOGYO CO., LTD.

  公开号：US20170176855A1

  公开（公告）日：2017-06-22

  A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, and which includes a base component (A) which exhibits changed solubility in a developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) including a compound (B1) represented by general formula (b1) shown below (in general formula (b1), R b1 represents a bridged alicyclic group having 7 to 30 carbon atoms and containing a polar group; Y b1 represents a linear hydrocarbon group of 9 or more carbon atoms which may have a substituent excluding at least one member selected from the group consisting of an aromatic hydrocarbon group and a vinyl group; V b1 represents a fluorinated alkylene group; m represents an integer of 1 or more; and M m+ represents an organic cation having a valency of m). R b1 —Y b1 —V b1 —SO 3 − (M m+ ) 1/m (b1)

  一种抗蚀组合物，在暴露后产生酸，并在酸的作用下在显影溶液中表现出改变的溶解度，包括在酸的作用下在显影溶液中表现出改变的溶解度的基组分（A）和在暴露后产生酸的酸生成组分（B），其中酸生成组分（B）包括下面所示的一般式（b1）表示的化合物（B1）（在一般式（b1）中，Rb1代表具有7至30个碳原子并含有极性基团的桥环脂环基团；Yb1代表具有9个或更多碳原子的线性烃基团，可能具有一个取代基，但不包括由芳香烃基团和乙烯基组成的至少一种成员；Vb1代表氟代烷基烯基团；m表示1或更多的整数；Mm+代表价数为m的有机阳离子）。Rb1—Yb1—Vb1—SO3−(Mm+)1/m（b1）
• RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND COMPOUND
  申请人：TOKYO OHKA KOGYO CO., LTD.

  公开号：US20200183273A1

  公开（公告）日：2020-06-11

  A resist composition including a base material component (A) whose solubility in a developing solution is changed due to the action of an acid, and a compound (D0) formed of an anion moiety and a cation moiety which is represented by Formula (d0), in which the cation moiety of the compound (D0) has a Log P value of less than 7.7. In the formula, M m+ represents an m-valent organic cation, R d0 represents a substituent, p represents an integer of 0 to 3, q represents an integer of 0 to 3, n represents an integer of 2 or greater, and a relationship of “n+p≤(q×2)+5” is satisfied.

  一种抗蚀组合物，包括一种基材料组分（A），由于酸的作用而在显影液中溶解性发生改变，以及由阴离子基团和由公式（d0）表示的阳离子基团组成的化合物（D0）。其中，化合物（D0）的阳离子基团的Log P值小于7.7。在公式中，Mm+表示m价有机阳离子，Rd0表示取代基，p表示0到3之间的整数，q表示0到3之间的整数，n表示大于等于2的整数，并且满足“n+p≤（q×2）+5”的关系。
• Resist composition and method for forming resist pattern
  申请人：TOKYO OHKA KOGYO CO., LTD.

  公开号：US10437147B2

  公开（公告）日：2019-10-08

  A resist composition which includes a polymer compound including a structural unit which is derived from an acrylic ester in which the hydrogen atom bonded to an α-position carbon atom may be substituted with a substituent and which has a lactone-containing cyclic group containing other electron withdrawing groups such as a cyano group at a side chain terminal, and a compound whose a conjugate acid has an acid dissociation constant (pKa) of less than 3.

  一种抗蚀剂组合物，其中包括一种聚合物化合物，其结构单元来自丙烯酸酯，在丙烯酸酯中，与 α 位碳原子结合的氢原子可被一个取代基取代，该聚合物化合物具有一个含内酯的环状基团，该环状基团含有其他取电子基团，如位于侧链末端的氰基，以及一种共轭酸的酸解离常数（pKa）小于 3 的化合物。
• Resist composition and method of forming resist pattern
  申请人：TOKYO OHKA KOGYO CO., LTD.

  公开号：US10921711B2

  公开（公告）日：2021-02-16

  A resist composition which generates an acid when exposed and whose solubility in a developer is changed by an action of an acid, the resist composition including: a base material component (A) whose solubility in a developer is changed by an action of an acid, in which the base material component (A) comprises a polymer compound (A1) having a constitutional unit (a01) represented by Formula (a0-1), a constitutional unit (a02) represented by Formula (a0-2), and a constitutional unit (a03) which is represented by Formula (a0-3) and has a structure different from the constitutional unit (a02).

  一种抗蚀剂组合物，在曝光时会产生酸，其在显影剂中的溶解度会因酸性物质的作用而改变，该抗蚀剂组合物包括在显影剂中的溶解度因酸的作用而改变的基材成分（A），其中基材成分（A）包括聚合物化合物（A1），聚合物化合物（A1）具有由式（a0-1）表示的构型单元（a01）、由式（a0-2）表示的构型单元（a02）和由式（a0-3）表示且结构不同于构型单元（a02）的构型单元（a03）。
• COMPOUND, RADICAL POLYMERIZATION INITIATOR, METHOD FOR PRODUCING COMPOUND, POLYMER, RESIST COMPOSITION, AND METHOD FOR FORMING RESIST PATTERN
  申请人：Utsumi Yoshiyuki

  公开号：US20140141373A1

  公开（公告）日：2014-05-22

  A compound represented by formula (I). In the formula, R 1 represents a hydrocarbon group of 1 to 10 carbon atoms; Z represents a hydrocarbon group of 1 to 10 carbon atoms or a cyano group; provided that R 1 and Z may be mutually bonded to form a ring; X represents a divalent linking group having any one selected from —O—C(═O)—, —NH—C(═O)— and —NH—C(═NH)— on a terminal that comes into contact with Q; p represents an integer of 1 to 3; Q represents a hydrocarbon group having a valency of (p+1), provided that, when p is 1, Q may be a single bond; R 2 represents a single bond, an alkylene group which may have a substituent or an arylene group which may have a substituent; q represents 0 or 1; r represents an integer of 0 to 8; and A + represents a metal cation or an organic cation.