[3-[2-(2-Methylbutan-2-yloxy)-2-oxoethoxy]-1-adamantyl] 2,2-dimethylbutanoate

• 分子结构分类: 有机化合物 - 脂质和类脂质分子 - 脂肪酰基
• 英文名称: [3-[2-(2-Methylbutan-2-yloxy)-2-oxoethoxy]-1-adamantyl] 2,2-dimethylbutanoate
• 英文别名: [3-[2-(2-methylbutan-2-yloxy)-2-oxoethoxy]-1-adamantyl] 2,2-dimethylbutanoate
• 化学式: C₂₃H₃₈O₅
• 分子量: 394.5
• InChiKey: SFNCUNHBXUATLK-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  5.1
• 重原子数：
  28
• 可旋转键数：
  10
• 环数：
  4.0
• sp3杂化的碳原子比例：
  0.91
• 拓扑面积：
  61.8
• 氢给体数：
  0
• 氢受体数：
  5

文献信息

• RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND COMPOUND
  申请人：Tokyo Ohka Kogyo Co., Ltd.

  公开号：US20140178821A1

  公开（公告）日：2014-06-26

  A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, including a base component (A) which exhibits changed solubility in a developing solution under action of acid, and a photo-decomposable quencher (D0) containing a compound represented by general formula (d0) shown below. In the formula, R 1 represents a hydrocarbon group of 4 to 20 carbon atoms which may have a substituent; Y 1 represents a single bond or a divalent linking group; R 2 and R 3 each independently represents a substituent of 0 to 20 carbon atoms other than a fluorine atom; one of R 2 and R 3 may form a ring with Y 1 ; M m+ represents an organic cation having a valency of m; and m represents an integer of 1 or more.
• RESIST COMPOSITION, COMPOUND, POLYMERIC COMPOUND AND METHOD OF FORMING RESIST PATTERN
  申请人：Tokyo Ohka Kogyo Co., Ltd.

  公开号：US20140356787A1

  公开（公告）日：2014-12-04

  A resist composition comprising a compound (m0) (wherein Rb 1 represents an electron withdrawing group; Rb 2 and Rb 3 each independently represents an aryl group, an alkyl group or an alkenyl group, provided that Rb 2 and Rb 3 may be mutually bonded to form a ring with the sulfur atom; and X0 − represents a monovalent counteranion).
• RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
  申请人：Tokyo Ohka Kogyo Co., Ltd.

  公开号：US20140363772A1

  公开（公告）日：2014-12-11

  A resist composition including a high-molecular weight compound having a constituent unit represented by general formula (a0-1), a constituent unit (a1) containing a group containing a monocyclic group or a chain group among acid decomposable groups whose polarity increases by action of acid, a constituent unit (a1′) containing a group containing a polycyclic group among acid decomposable groups whose polarity increases by the action of an acid, and a constituent unit (a2) containing a lactone-containing monocyclic group, with a proportion of the constituent unit (a1) being equal to a proportion of the constituent unit (a1′) or more; and a method for forming a resist pattern using the resist composition.
• RESIST COMPOSITION, ACID GENERATOR, POLYMERIC COMPOUND AND METHOD OF FORMING RESIST PATTERN
  申请人：Tokyo Ohka Kogyo Co., Ltd.

  公开号：US20150037734A1

  公开（公告）日：2015-02-05

  A resist composition containing a compound represented by general formula (m0), wherein R 1 and R 2 each independently represents an aryl group which may have a substituent, an alkyl group which may have a substituent, or an alkenyl group which may have a substituent, provided that R 1 and R 2 may be mutually bonded to form a ring with the sulfur atom; R 3 represents an aromatic hydrocarbon group which may have a substituent, an alkenyl group which may have a substituent, or an alkynyl group which may have a substituent; V 1 represents a single bond or an alkylene group, provided that, when R 3 is an aromatic hydrocarbon group which may have a substituent, V 1 is an alkylene group; and X0 − represents a monovalent organic anion.
• RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COMPOUND, COMPOUND
  申请人：Tokyo Ohka Kogyo Co., Ltd.

  公开号：US20150140497A1

  公开（公告）日：2015-05-21

  A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, and which includes a base component (A) which exhibits changed solubility in a developing solution under action of acid, the base component (A) including a polymeric compound (A1) having a structural unit (a0) represented by general formula (a0-0) shown below (wherein V 11 represents an aliphatic cyclic group with or without a substituent; R 1 represents a lactam-containing cyclic group or a sultam-containing cyclic group; Y 1 represents an oxygen atom (—O—), an ester bond (—C(═O)—O—) or a single bond; and W 2 represents a group formed by a polymerization reaction of a polymerizable group-containing group).