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2-(2-Prop-2-enoyloxyethyl)cyclohex-3-ene-1,2-dicarboxylic acid

中文名称
——
中文别名
——
英文名称
2-(2-Prop-2-enoyloxyethyl)cyclohex-3-ene-1,2-dicarboxylic acid
英文别名
2-(2-prop-2-enoyloxyethyl)cyclohex-3-ene-1,2-dicarboxylic acid
2-(2-Prop-2-enoyloxyethyl)cyclohex-3-ene-1,2-dicarboxylic acid化学式
CAS
——
化学式
C13H16O6
mdl
——
分子量
268.26
InChiKey
YDRQKFSCVSLQKI-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    1.2
  • 重原子数:
    19
  • 可旋转键数:
    7
  • 环数:
    1.0
  • sp3杂化的碳原子比例:
    0.46
  • 拓扑面积:
    101
  • 氢给体数:
    2
  • 氢受体数:
    6

文献信息

  • RESIN COMPOSITION FOR MASKS
    申请人:Higuchi Michiya
    公开号:US20140186766A1
    公开(公告)日:2014-07-03
    The present invention provides a resin composition for resist to be efficiently formed into a cured product with high properties of crack resistance, bulge resistance, protrusion resistance, and the like for filling a through-hole, a via hole, or the like with the cured product. The resin composition for masks in accordance with the present invention contains a first resin and a second resin. The first resin is prepared by an addition reaction of polybasic acid anhydride with an adduct of an ethylenically unsaturated compound having a carboxyl group and bifunctional epoxy resin. The second resin having; a group obtained by an addition reaction of an epoxy group with monocarboxylic acid; and a group obtained by addition reaction of an epoxy group with polybasic acid.
    本发明提供了一种树脂组合物,用于将经过硬化的产物高效地形成具有耐裂纹性、耐凸起性、耐突起性等高性能的填充通孔、过孔或类似物的材料。本发明所述的用于制作掩膜的树脂组合物包含第一树脂和第二树脂。第一树脂是通过多元酸酐与具有羧基的乙烯基不饱和化合物和双官能团环氧树脂的加成反应制备而成。第二树脂具有:通过环氧基与单羧酸的加成反应获得的基团;以及通过环氧基与多元酸的加成反应获得的基团。
  • RESIN COMPOSITION FOR RESISTS
    申请人:Goo Chemical Co., Ltd.
    公开号:EP2743286A1
    公开(公告)日:2014-06-18
    The present invention provides a resin composition for resist to be efficiently formed into a cured product with high properties of crack resistance, bulge resistance, protrusion resistance, and the like for filling a through-hole, a via hole, or the like with the cured product. The resin composition for masks in accordance with the present invention contains a first resin and a second resin. The first resin is prepared by an addition reaction of polybasic acid anhydride with an adduct of an ethylenically unsaturated compound having a carboxyl group and bifunctional epoxy resin. The second resin having: a group obtained by an addition reaction of an epoxy group with monocarboxylic acid; and a group obtained by addition reaction of an epoxy group with polybasic acid.
    本发明提供了一种抗蚀剂用树脂组合物,该树脂组合物可有效地形成具有高抗裂性、抗隆起性、抗突起性等特性的固化物,用于用固化物填充通孔、通孔等。根据本发明,掩模用树脂组合物包含第一种树脂和第二种树脂。第一种树脂是通过聚碱性酸酐与具有羧基的乙烯不饱和化合物和双官能环氧树脂的加合物的加成反应制备的。第二种树脂具有:通过环氧基团与单羧酸的加成反应得到的基团;以及通过环氧基团与多基酸的加成反应得到的基团。
  • Method for manufacturing structure having recessed pattern, resin composition, method for forming electroconductive film, electronic circuit, and electronic device
    申请人:JSR CORPORATION
    公开号:US10392699B2
    公开(公告)日:2019-08-27
    The present invention relates to: a method of producing a structure having a recessed pattern; a resin composition; a method of forming an electroconductive film; an electronic circuit; and an electronic device. The method of producing a structure having a recessed pattern includes the following steps (i) and (ii), and the recessed pattern has a film thickness that is thinner by 5% to less than 90% with respect to that of a coating film obtained in the step (i): (i) the step of forming a coating film on a non-flat surface of a structure using a resin composition which includes an acid-dissociable group-containing polymer and an acid generator; and (ii) the step of forming a recess by subjecting a prescribed part of a portion of the coating film to irradiation with radiation.
    本发明涉及:一种生产具有凹陷图案的结构的方法;一种树脂组合物;一种形成导电薄膜的方法;一种电子电路;以及一种电子设备。生产具有凹陷图案的结构的方法包括以下步骤(i)和(ii),凹陷图案的薄膜厚度比步骤(i)中获得的涂膜薄 5%至小于 90%: (i) 使用树脂组合物在结构的非平面上形成涂膜的步骤,该树脂组合物包括含酸可分解基团的聚合物和酸生成物;以及 (ii) 通过对涂膜部分的规定部分进行辐射形成凹槽的步骤。
  • Polarizing film, method for producing same, optical film, image display device, and adhesion improvement-treated polarizer
    申请人:NITTO DENKO CORPORATION
    公开号:US11061175B2
    公开(公告)日:2021-07-13
    A polarizing film, comprising a polarizer, and a transparent protective film laminated on/over at least one surface of the polarizer to interpose an adhesive layer between the surface and the transparent protective film, and the polarizing film comprising, on/over the adhesion surface of the polarizer, an adhesion-improving layer interposed between the polarizer and the adhesive layer. The adhesion-improving layer preferably comprises a compound represented by the following general formula (1): wherein X is a functional group containing a reactive group, and R1 and R2 each independently represent a hydrogen atom, or an aliphatic hydrocarbon group, aryl group or heterocyclic group that may have a substituent, and the compound represented by the general formula (1) is interposed between the polarizer and the adhesive layer.
    一种偏振膜,包括偏振片和层压在偏振片至少一个表面上/上的透明保护膜,在该表面和透明保护膜之间插入粘合层,偏振膜在偏振片的粘合表面上/上包括插入偏振片和粘合层之间的附着力增强层。附着力增强层最好由以下通式 (1) 所代表的化合物组成: 其中,X 是含有活性基团的官能团,R1 和 R2 各自独立地代表氢原子,或可具有取代基的脂族烃基、芳基或杂环基,通式(1)所代表的化合物夹在偏振片和粘合剂层之间。
  • Organic metal compound-containing composition
    申请人:NITTO DENKO CORPORATION
    公开号:US11046719B2
    公开(公告)日:2021-06-29
    An organic metal compound-containing composition, comprising: at least one organic metal compound (A) selected from the group consisting of metal alkoxides and metal chelates, and a polymerizable compound (B) having a polymerizable functional group and a carboxyl group.
    一种含有机属化合物的组合物,包括:至少一种选自属烷氧基化合物和属螯合物的有机属化合物(A),以及一种具有可聚合官能团和羧基的可聚合化合物(B)。
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