1-Morpholin-4-ylethyl dodecanoate

• 分子结构分类: 有机化合物 - 脂质和类脂质分子 - 脂肪酰基
• 英文名称: 1-Morpholin-4-ylethyl dodecanoate
• 英文别名: 1-morpholin-4-ylethyl dodecanoate
• 化学式: C₁₈H₃₅NO₃
• 分子量: 313.5
• InChiKey: IYYIRGBTKGRXIO-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  5.5
• 重原子数：
  22
• 可旋转键数：
  13
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.94
• 拓扑面积：
  38.8
• 氢给体数：
  0
• 氢受体数：
  4

文献信息

• RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD, COMPOUND AND METHOD OF GENERATING ACID
  申请人：JSR CORPORATION

  公开号：US20200341376A1

  公开（公告）日：2020-10-29

  A radiation-sensitive resin composition contains: a polymer that includes a structural unit including an acid-labile group; and a radiation-sensitive acid generating agent. The radiation-sensitive acid generating agent includes a sulfonate anion and a radiation-sensitive cation. The sulfonate anion includes two or more rings, and an iodine atom and a monovalent group having 0 to 10 carbon atoms which includes at least one of an oxygen atom and a nitrogen atom bond to at least one of the two or more rings. The ring is preferably an aromatic ring. The radiation-sensitive acid generating agent is preferably a compound represented by formula (1). In the formula (1), A 1 represents a group obtained from a compound which includes a ring having 3 to 20 ring atoms by removing (p+q+r+1) hydrogen atoms on the ring.

  一种辐射敏感树脂组合物包含：包括含有酸敏感基团的结构单元的聚合物；和辐射敏感酸发生剂。辐射敏感酸发生剂包括磺酸根离子和辐射敏感阳离子。磺酸根离子包括两个或两个以上的环，以及一个碘原子和一个含有0至10个碳原子的一价基团，其中该基团至少包括一个氧原子和一个氮原子，与两个或两个以上的环中的至少一个结合。环最好是芳香环。辐射敏感酸发生剂最好是由式（1）表示的化合物。在式（1）中，A1表示通过去除环上（p+q+r+1）个氢原子而获得的由含有3至20个环原子的环的化合物得到的基团。
• PATTERN-FORMING METHOD AND RADIATION-SENSITIVE COMPOSITION
  申请人：JSR CORPORATION

  公开号：US20210181627A1

  公开（公告）日：2021-06-17

  A pattern-forming method includes: applying directly or indirectly on a substrate a radiation-sensitive composition containing a complex and an organic solvent to form a film; exposing the film to an ultraviolet ray, a far ultraviolet ray, an extreme ultraviolet ray, or an electron beam; and developing the film exposed, wherein the complex is represented by formula (1). [M m L n Q p ]  (1) In the formula (1), M represents a zinc atom, a cobalt atom, a nickel atom, a hafnium atom, a zirconium atom, a titanium atom, an iron atom, a chromium atom, a manganese atom, or an indium atom; and L represents a ligand derived from a compound represented by formula (2). R 1 —CHR 3 —R 2 (2) In the formula (2), R 1 and R 2 each independently represent —C(═O)—R A , —C(═O)—OR B , or —CN.

  一种图案形成方法包括：在基板上直接或间接地涂覆含有复合物和有机溶剂的辐射敏感组合物以形成膜；将膜暴露于紫外线、远紫外线、极紫外线或电子束；和显影所暴露的膜，其中该复合物由式（1）表示。[MmLnQp] (1)在式（1）中，M代表锌原子、钴原子、镍原子、铪原子、锆原子、钛原子、铁原子、铬原子、锰原子或铟原子；L代表来自由式（2）表示的化合物的配体。R1—CHR3—R2(2)在式（2）中，R1和R2分别独立地表示—C(═O)—RA、—C(═O)—ORB或—CN。
• RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD, AND COMPOUND
  申请人：JSR CORPORATION

  公开号：US20180319740A1

  公开（公告）日：2018-11-08

  A radiation-sensitive resin composition includes a first polymer including a first structural unit that includes a first acid-labile group; a radiation-sensitive acid generator; and a compound represented by formula (1). n is 1 or 2. R 1 represents a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms in a case in which n is 1. R 1 represents a divalent organic group having 1 to 20 carbon atoms in a case in which n is 2. R 2 represents a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms. E represents a group represented by formula (i). R 2 and E may taken together represent a ring structure having 3 to 20 ring atoms together with the nitrogen atom. X represents a divalent organic group having 1 to 20 carbon atoms. R 3 represents a second acid-labile group.

  一种辐射敏感性树脂组合物包括第一聚合物，其中包括第一个酸敏感基团的第一个结构单元；辐射敏感性酸发生剂；以及由式（1）表示的化合物。n为1或2。当n为1时，R1代表氢原子或具有1至20个碳原子的一价有机基团。当n为2时，R1代表具有1至20个碳原子的二价有机基团。R2代表氢原子或具有1至20个碳原子的一价有机基团。E代表由式（i）表示的基团。R2和E可能一起表示具有3至20个环原子的环结构，与氮原子一起。X代表具有1至20个碳原子的二价有机基团。R3代表第二个酸敏感基团。
• Radiation-sensitive composition, pattern-forming method and radiation-sensitive acid generating agent
  申请人：JSR CORPORATION

  公开号：US11204552B2

  公开（公告）日：2021-12-21

  A radiation-sensitive composition includes: a first polymer having a first structural unit that includes an acid-labile group; and a first compound including a metal cation and a first anion that is a conjugate base of an acid. The acid has a pKa of no greater than 0. The acid is preferably sulfonic acid, nitric acid, organic azinic acid, disulfonylimidic acid or a combination thereof. The first compound is preferably represented by formula (1). In the formula (1), M represents a metal cation; A represents the first anion; x is an integer of 1 to 6; R1 represents a σ ligand; and y is an integer of 0 to 5, and a sum: x+y is no greater than 6. The van der Waals volume of the acid is preferably no less than 2.5×10−28 m3. [AxMR1y]  (1)

  一种辐射敏感的组合物包括：第一聚合物，具有包括酸敏感基团的第一结构单元;和第一化合物，包括金属阳离子和第一阴离子，该第一阴离子是酸的共轭碱。该酸的pKa不大于0。该酸优选为磺酸，硝酸，有机氮酸，二磺基亚胺酸或其组合物。第一化合物优选由式（1）表示。在式（1）中，M表示金属阳离子; A表示第一阴离子; x为1至6的整数; R1表示σ配体; y为0至5的整数，且总和：x+y不大于6。该酸的范德华体积优选不小于2.5×10−28 m3。[AxMR1y]  (1)
• RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD AND ACID DIFFUSION CONTROL AGENT
  申请人：JSR Corporation

  公开号：US20180321585A1

  公开（公告）日：2018-11-08

  A radiation-sensitive resin composition includes: a first polymer having a first structural unit that includes an acid-labile group; a radiation-sensitive acid generator; and a first compound capable of forming a salt through a structural change in a molecule thereof upon irradiation with a radioactive ray. Basicity of the first compound preferably changes upon irradiation with a radioactive ray. The first compound preferably generates an acid upon irradiation with a radioactive ray. The first compound is preferably represented by formula (1). In formula (1), Ar 1 represents a substituted or unsubstituted heteroarenediyl group having 4 to 30 ring atoms and having at least one nitrogen atom as a ring-constituting atom.

  一种辐射敏感的树脂组合物，包括：具有包含酸敏感基团的第一结构单元的第一聚合物；辐射敏感的酸发生剂；以及第一化合物，能够通过其分子的结构变化形成盐，经过放射性射线照射后。第一化合物的碱性最好在经过放射性射线照射后发生变化。第一化合物在经过放射性射线照射后最好能够生成酸。第一化合物最好由公式（1）表示。在公式（1）中，Ar1代表具有4到30个环原子和至少一个氮原子作为环构成原子的取代或未取代的杂环芳基基团。