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2-Methoxyethyl 2,2-difluoro-2-(trifluoromethylsulfonylsulfamoyl)acetate

中文名称
——
中文别名
——
英文名称
2-Methoxyethyl 2,2-difluoro-2-(trifluoromethylsulfonylsulfamoyl)acetate
英文别名
2-methoxyethyl 2,2-difluoro-2-(trifluoromethylsulfonylsulfamoyl)acetate
2-Methoxyethyl 2,2-difluoro-2-(trifluoromethylsulfonylsulfamoyl)acetate化学式
CAS
——
化学式
C6H8F5NO7S2
mdl
——
分子量
365.3
InChiKey
GJJXZXNWNFDOQX-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    0.6
  • 重原子数:
    21
  • 可旋转键数:
    8
  • 环数:
    0.0
  • sp3杂化的碳原子比例:
    0.83
  • 拓扑面积:
    133
  • 氢给体数:
    1
  • 氢受体数:
    13

文献信息

  • POLYMER, RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
    申请人:Utsumi Yoshiyuki
    公开号:US20130022911A1
    公开(公告)日:2013-01-24
    A polymer containing an anion part which generates acid upon exposure on at least one terminal of the main chain, and at least one structural unit selected from the group consisting of a structural unit (a0) containing a —SO 2 -containing cyclic group, a structural unit (a3) containing at least one group selected from the group consisting of —OH, —COOH, —CN, —SO 2 NH 2 and —CONH 2 and a structural unit (a5) which generates acid upon exposure.
  • RESIST COMPOSITION, COMPOUND, POLYMERIC COMPOUND AND METHOD OF FORMING RESIST PATTERN
    申请人:Tokyo Ohka Kogyo Co., Ltd.
    公开号:US20140356787A1
    公开(公告)日:2014-12-04
    A resist composition comprising a compound (m0) (wherein Rb 1 represents an electron withdrawing group; Rb 2 and Rb 3 each independently represents an aryl group, an alkyl group or an alkenyl group, provided that Rb 2 and Rb 3 may be mutually bonded to form a ring with the sulfur atom; and X0 − represents a monovalent counteranion).
  • RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COMPOUND, COMPOUND
    申请人:Tokyo Ohka Kogyo Co., Ltd.
    公开号:US20150140497A1
    公开(公告)日:2015-05-21
    A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, and which includes a base component (A) which exhibits changed solubility in a developing solution under action of acid, the base component (A) including a polymeric compound (A1) having a structural unit (a0) represented by general formula (a0-0) shown below (wherein V 11 represents an aliphatic cyclic group with or without a substituent; R 1 represents a lactam-containing cyclic group or a sultam-containing cyclic group; Y 1 represents an oxygen atom (—O—), an ester bond (—C(═O)—O—) or a single bond; and W 2 represents a group formed by a polymerization reaction of a polymerizable group-containing group).
  • US8778595B2
    申请人:——
    公开号:US8778595B2
    公开(公告)日:2014-07-15
  • US9244347B2
    申请人:——
    公开号:US9244347B2
    公开(公告)日:2016-01-26
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