RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COMPOUND, COMPOUND
申请人:Tokyo Ohka Kogyo Co., Ltd.
公开号:US20150140497A1
公开(公告)日:2015-05-21
A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, and which includes a base component (A) which exhibits changed solubility in a developing solution under action of acid, the base component (A) including a polymeric compound (A1) having a structural unit (a0) represented by general formula (a0-0) shown below (wherein V
11
represents an aliphatic cyclic group with or without a substituent; R
1
represents a lactam-containing cyclic group or a sultam-containing cyclic group; Y
1
represents an oxygen atom (—O—), an ester bond (—C(═O)—O—) or a single bond; and W
2
represents a group formed by a polymerization reaction of a polymerizable group-containing group).