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[2-Oxo-2-[(2-propan-2-yl-1-adamantyl)oxy]ethyl] 2,2-dimethylbutanoate

中文名称
——
中文别名
——
英文名称
[2-Oxo-2-[(2-propan-2-yl-1-adamantyl)oxy]ethyl] 2,2-dimethylbutanoate
英文别名
[2-oxo-2-[(2-propan-2-yl-1-adamantyl)oxy]ethyl] 2,2-dimethylbutanoate
[2-Oxo-2-[(2-propan-2-yl-1-adamantyl)oxy]ethyl] 2,2-dimethylbutanoate化学式
CAS
——
化学式
C21H34O4
mdl
——
分子量
350.5
InChiKey
NAPAQOVPQMMHMD-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    5.7
  • 重原子数:
    25
  • 可旋转键数:
    8
  • 环数:
    4.0
  • sp3杂化的碳原子比例:
    0.9
  • 拓扑面积:
    52.6
  • 氢给体数:
    0
  • 氢受体数:
    4

文献信息

  • ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM USING THE SAME, PATTERN FORMING METHOD, MANUFACTURING METHOD OF ELECTRONIC DEVICE AND ELECTRONIC DEVICE
    申请人:FUJIFILM Corporation
    公开号:US20140356771A1
    公开(公告)日:2014-12-04
    There is provided an actinic ray-sensitive or radiation-sensitive resin composition, having: (A) a resin having a repeating unit represented by formula (I); (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; and (C) a resin having at least one repeating unit (x) out of a repeating unit represented by formula (II) and a repeating unit represented by formula (III) and containing substantially neither fluorine atom nor silicon atom, wherein the content of the repeating unit (x) is 90% or more by mole based on all repeating units in the resin (C).
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