Provided are a hardmask composition, a method of forming a pattern using the hardmask composition, and a hardmask formed using the hardmask composition. The hardmask composition includes a polar nonaqueous organic solvent and one of: i) a mixture of graphene quantum dots and at least one selected from a diene and a dienophile, ii) a Diels-Alder reaction product of the graphene quantum dots and the at least one selected from a diene and a dienophile, iii) a thermal treatment product of the Diels-Alder reaction product of graphene quantum dots and the at least one selected from a diene and a dienophile, or iv) a combination thereof.
本文提供了一种硬掩膜组合物、一种使用硬掩膜组合物形成图案的方法,以及一种使用硬掩膜组合物形成的硬掩膜。硬掩膜组合物包括极性非
水有机溶剂和以下物质之一:i)
石墨烯量子点和至少一种选自二烯烃和亲二烯烃的混合物;ii)
石墨烯量子点和至少一种选自二烯烃和亲二烯烃的 Diels-Alder 反应产物;iii)
石墨烯量子点和至少一种选自二烯烃和亲二烯烃的 Diels-Alder 反应产物的热处理产物;或 iv) 它们的组合。