Bis(2-hydroxybutyl) propanedioate

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 羧酸及其衍生物
• 英文名称: Bis(2-hydroxybutyl) propanedioate
• 英文别名: bis(2-hydroxybutyl) propanedioate
• 化学式: C₁₁H₂₀O₆
• 分子量: 248.27
• InChiKey: VYUMJDXWZLWLFV-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  0.7
• 重原子数：
  17
• 可旋转键数：
  10
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.82
• 拓扑面积：
  93.1
• 氢给体数：
  2
• 氢受体数：
  6

文献信息

• POLYMER AND COMPOSITION INCLUDING SAME, AND ADHESIVE COMPOSITION
  申请人：Tamura Mamoru

  公开号：US20140228488A1

  公开（公告）日：2014-08-14

  There is provided a novel polymer, a composition containing the polymer, and a novel adhesive composition containing the polymer from which a cured film having desired properties is obtained. A polymer comprising a structural unit of Formula (1): wherein Q is a bivalent group, R 1 is a C 1-10 alkylene group, a C 2-10 alkenylene group or C 2-10 alkynylene group, a C 6-14 arylene group, a C 4-10 cyclic alkylene group, etc., or a polymer comprising a structural unit of Formula (6): wherein Q 4 is an allyl group, a vinyl group, an epoxy group, or a glycidyl group, and R 5 is a bivalent organic group having a main chain containing only carbon atom or at least one of oxygen atom, nitrogen atom and sulfur atom in addition to carbon atom, a composition comprising the polymer, and an adhesive composition comprising the polymer and a solvent.
• RESIST UNDERLAYER FILM-FORMING COMPOSITION
  申请人：NISSAN CHEMICAL INDUSTRIES, LTD.

  公开号：US20150337164A1

  公开（公告）日：2015-11-26

  There is provided a resist underlayer film-forming composition having excellent solubility in a solvent containing propylene glycol monomethyl ether as a main component. A resist underlayer film-forming composition comprising a polymer having a structural unit of Formula (1a) or Formula (1c) and a structural unit of Formula (1b) and a solvent containing more than 50% by mass of propylene glycol monomethyl ether, wherein in the polymer, the structural unit of Formula (1a) or Formula (1c) and the structural unit of Formula (1b) are arranged alternately. (In Formulae (1a) and (1b), Q is a phenylene group or a naphthylene group, m is 1 or 2, and each of n is independently 0 or 1.)
• RESIST UNDERLAYER FILM FORMATION COMPOSITION AND METHOD FOR FORMING RESIST PATTERN USING THE SAME
  申请人：NISSAN CHEMICAL INDUSTRIES, LTD.

  公开号：US20160238936A1

  公开（公告）日：2016-08-18

  A novel resist underlayer film formation composition for lithography includes: a polymer having a structure of Formula (1) at a terminal of a polymer chain; a cross-linking agent; a compound promoting a cross-linking reaction; and an organic solvent: (where R 1 , R 2 , and R 3 are each independently a hydrogen atom, a linear or branched C 1-13 alkyl group, a halogeno group, or a hydroxy group; at least one of R 1 , R 2 , and R 3 is the alkyl group; Ar is a benzene ring, a naphthalene ring, or an anthracene ring; two carbonyl groups are bonded to respective two adjacent carbon atoms of Ar; and X is a linear or branched C 1-6 alkyl group optionally having a C 1-3 alkoxy group as a substituent).
• RESIST UNDERLAYER FILM-FORMING COMPOSITION AND METHOD FOR FORMING RESIST PATTERN USING THE SAME
  申请人：NISSAN CHEMICAL INDUSTRIES, LTD.

  公开号：US20170045820A1

  公开（公告）日：2017-02-16

  A composition for forming a resist underlayer film which make possible to form a desired high-adhesion resist pattern. A resist underlayer film-forming composition for lithography containing a polymer having the following structure Formula (1) or (2) at a terminal of a polymer chain, crosslinker, compound promoting crosslinking reaction, and organic solvent. (wherein R 1 is a C 1-6 alkyl group optionally having a substituent, phenyl group, pyridyl group, halogeno group, or hydroxy group, R 2 is a hydrogen atom, a C 1-6 alkyl group, hydroxy group, halogeno group, or ester group of —C(═O)O—X wherein X is a C 1-6 alkyl group optionally having a substituent, R 3 is a hydrogen atom, a C 1-6 alkyl group, hydroxy group, or halogeno group, R 4 is a direct bond or divalent C 1-8 organic group, R 5 is a divalent C 1-8 organic group, A is an aromatic ring or heteroaromatic ring, t is 0 or 1, and u is 1 or 2.)
• US8962234B2
  申请人：——

  公开号：US8962234B2

  公开（公告）日：2015-02-24