3-methylhexahydrophthalide | 90765-50-7

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 异苯并呋喃
• 英文名称: 3-methylhexahydrophthalide
• 英文别名: 3-methyl-3a,4,5,6,7,7a-hexahydro-3H-2-benzofuran-1-one
• CAS: 90765-50-7
• 化学式: C₉H₁₄O₂
• 分子量: 154.209
• InChiKey: LRCFBLCWYSNMBD-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.1
• 重原子数：
  11
• 可旋转键数：
  0
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.89
• 拓扑面积：
  26.3
• 氢给体数：
  0
• 氢受体数：
  2

反应信息

• 作为产物：
  描述：

  ethyl 2-methyl-1-hydroxycyclohexylacetate 生成 3-methylhexahydrophthalide
  参考文献：
  名称：

  DOBREV A.; DIMITROVA B.; TCHOLAKOVA T.; IVANOW C., GODISHN. SOFIJSK. YH-T. XIM. FAK., 1975-1976(1979), 70, NO 2, 5-10

  摘要：

  DOI：

文献信息

• Intramolecular [4 + 2] cycloadditions of nitroalkenes with olefins
  作者：Scott E. Denmark、Michael S. Dappen、Christopher J. Cramer

  DOI：10.1021/ja00266a036

  日期：1986.3

  Cycloadditions stereoselectives intramoleculaires en presence de SnCl 4 de nitro-1 nonadiene-1,7 et de nitro-2 decadiene-2,8: obtention d'oxydes-3 d'hexahydro-4a,5,6,7,8,8a benzooxazines-2,3

  Cycloadditions 立体选择性分子内存在 de SnCl 4 de nitro-1 nonadiene-1,7 et de nitro-2 decadiene-2,8: 获得 d'oxydes-3 d'hexahydro-4a,5,6,7,8,8a benzooxazines -2,3
• Intramolecular [4+2]-cycloadditions of nitroalkenes with olefins. 2
  作者：Scott E. Denmark、Young-Choon Moon、Christopher J. Cramer、Michael S. Dappen、C.B.W. Senanayake

  DOI：10.1016/s0040-4020(01)89054-2

  日期：1990.1

  The intramolecular [4+2]-cycloadditions of di- and trisubstituted nitroalkenes with unactivated olefins are described. The cycloadditions proceed readily at low temperatures in the presence of SnCl4. The reactions are shown to be stereospecific in the preservation of dienophile configuration in the product. The configuration of the heterodiene controls the stereochemistry of the ring fusion but the

  描述了二和三取代的硝基烯烃与未活化的烯烃的分子内[4 + 2]-环加成。在存在SnCl 4的情况下，环加成反应在低温下容易进行。在保持产物中的亲双烯体构型方面，反应显示为立体特异性的。杂二烯的构型控制环稠合的立体化学，但是只有三取代的硝基烯烃才具有很高的选择性。一环加成率顺亲二烯物是CA。比反双亲嗜酒者快20倍。讨论了机制和过渡结构的含义
• CARBAMATE FUNCTIONAL POLYMERS AND COMPOSITIONS CONTAINING SAME
  申请人：PPG INDUSTRIES, INC.

  公开号：EP0925318A1

  公开（公告）日：1999-06-30
• COPOLYMER FOR IMMERSION LITHOGRAPHY AND COMPOSITIONS
  申请人：Yamagishi Takanori

  公开号：US20100047710A1

  公开（公告）日：2010-02-25

  The present invention provides a copolymer which can prevent problems associated with immersion lithography (including occurrence of a pattern defect such as water mark, and variation in sensitivity or abnormal patterning due to elution of an additive such as a radiation-sensitive acid-generator) and which provides surface characteristics suitable for immersion lithography, and a composition containing the copolymer. The copolymer for immersion lithography has, at least, a repeating unit (A) that generates an alkali-soluble group by removing protecting group through action of an acid, and a repeating unit (B) having a lactone structure, wherein, when a solution of the copolymer in propylene glycol monomethyl ether acetate (hereinafter may be abbreviated as “PGMEA”) is applied to a wafer and then heated to form a thin film, and a 15-μL droplet of pure water is added onto the thin film, the inclination of the wafer at the time when the water droplet starts to move is 35° or less, or the contact angle of the top edge of the water droplet at the time when the water droplet starts to move is 64° or more.
• PROCESS FOR PRODUCING POLYMER FOR SEMICONDUCTOR LITHOGRAPHY
  申请人：Yamagishi Takanori

  公开号：US20100048848A1

  公开（公告）日：2010-02-25

  To provide a method for producing a polymer for semiconductor lithography which can attain high uniformity in the polymer from lot to lot. The method for producing a polymer for semiconductor lithography includes the step (P) of heating a polymerizable monomer and a polymerization initiator in a solvent, to thereby polymerize the monomer, the step (P) having the step of controlling a polymerization pressure by regulating a liquid level in a container (WO) which is disposed between a polymerization tank and the atmospheric air and which provides liquid sealing.