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4-[2-Methyl-1-(4-methylthiophen-2-yl)-1-oxidoazet-1-ium-2-yl]morpholine

中文名称
——
中文别名
——
英文名称
4-[2-Methyl-1-(4-methylthiophen-2-yl)-1-oxidoazet-1-ium-2-yl]morpholine
英文别名
4-[2-methyl-1-(4-methylthiophen-2-yl)-1-oxidoazet-1-ium-2-yl]morpholine
4-[2-Methyl-1-(4-methylthiophen-2-yl)-1-oxidoazet-1-ium-2-yl]morpholine化学式
CAS
——
化学式
C13H18N2O2S
mdl
——
分子量
266.36
InChiKey
GLPDOTCTVKQZCS-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    1.6
  • 重原子数:
    18
  • 可旋转键数:
    2
  • 环数:
    3.0
  • sp3杂化的碳原子比例:
    0.54
  • 拓扑面积:
    58.8
  • 氢给体数:
    0
  • 氢受体数:
    4

文献信息

  • Photosensitive resin composition, and polymer film made therefrom
    申请人:Zhen Ding Technology Co., Ltd.
    公开号:US10928730B2
    公开(公告)日:2021-02-23
    A photosensitive resin composition comprises a modified polyimide polymer having a chemical structural formula of: photosensitive monomers, a bisphenol A epoxy resin, a photo-initiator, and a pigment. The modified polyimide polymer is made by a reaction of a polyimide polymer having a chemical structural formula of: and glycidyl methacrylate. The carboxyl group of the polyimide polymer reacts with the epoxy group of glycidyl methacrylate. The polyimide polymer is made by a reaction of dianhydride monomers each having an A group, diamine monomers each having the R group, diamine monomers each having the R1 group, and diamine monomers each having the R2 group. The diamine monomer having R group is a diamine compound having R group bonding with the carboxyl group. The diamine monomer having R1 group is a soft long-chain diamine monomer. R2 group comprises at least one secondary amine group or tertiary amine group.
    一种光敏树脂组合物包含一种改性聚酰亚胺聚合物,其化学结构式为 光敏单体、双 A 环氧树脂、光引发剂颜料。改性聚酰亚胺聚合物是由具有以下化学结构式的聚酰亚胺聚合物反应制成的: 和甲基丙烯酸缩水甘油酯。聚酰亚胺聚合物的羧基与甲基丙烯酸缩水甘油酯的环氧基发生反应。聚酰亚胺聚合物是由具有 A 基团的二酐单体、具有 R 基团的二胺单体、具有 R1 基团的二胺单体和具有 R2 基团的二胺单体反应而成。具有 R 基的二胺单体是具有与羧基成键的 R 基的二胺化合物。具有 R1 基团的二胺单体是软长链二胺单体。R2 基团包括至少一个仲胺基团或叔胺基团。
  • PHOTOSENSITIVE RESIN COMPOSITION FOR COLOR FILTER AND APPLICATION THEREOF
    申请人:CHI MEI CORPORATION
    公开号:US20150315376A1
    公开(公告)日:2015-11-05
    The present invention relates to a photosensitive resin composition for color filter and application thereof. The aforementioned photosensitive resin composition includes an alkali-soluble resin (A), a compound having a vinyl unsaturated group (B), a photo-initiator (C), an organic solvent (D), and a pigment (E). The alkali-soluble resin (A) is obtained by copolymerizing a vinyl unsaturated monomer having a carboxylic group (a1), a vinyl unsaturated monomer having a silane group (a2), a vinyl unsaturated monomer having an oxetanyl group (a3) and an other copolymerizable vinyl unsaturated monomer (a4).
  • RESIN COMPOSITION AND ADHESIVE FILM AND CIRCUIT BOARD MADE OF THE SAME
    申请人:FuKui Precision Component (Shenzhen) Co., Ltd.
    公开号:US20170275508A1
    公开(公告)日:2017-09-28
    A resin composition suitable as an adhesive layer and as a circuit board substrate includes an acrylic resin, a non-photosensitive resin with carboxyl groups, nano core-shell particles, a photoinitiator, and a solvent, such adhesive layer and circuit board substrate being high-strength and temperature-resistant whilst retaining flexibility. The acrylic resin is in an amount by weight of 150 parts in the resin composition, the non-photosensitive resin is in an amount by weight of 30 parts to 80 parts in the resin composition, the nano core-shell particles are in an amount by weight of 5 parts to 30 parts in the resin composition, and the photoinitiator is in an amount by weight of 1 part to 10 parts in the resin composition.
  • US9268218B2
    申请人:——
    公开号:US9268218B2
    公开(公告)日:2016-02-23
  • US9274419B2
    申请人:——
    公开号:US9274419B2
    公开(公告)日:2016-03-01
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