Tert-butyl 2-methyl-2-[(4-methylphenoxy)methyl]-3-oxobutanoate

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯酚醚
• 英文名称: Tert-butyl 2-methyl-2-[(4-methylphenoxy)methyl]-3-oxobutanoate
• 英文别名: tert-butyl 2-methyl-2-[(4-methylphenoxy)methyl]-3-oxobutanoate
• 化学式: C₁₇H₂₄O₄
• 分子量: 292.4
• InChiKey: VXROGHUQBKNJMG-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.4
• 重原子数：
  21
• 可旋转键数：
  7
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.53
• 拓扑面积：
  52.6
• 氢给体数：
  0
• 氢受体数：
  4

文献信息

• PHOTOSENSITIVE RESIN COMPOSITIONS, PROCESSES FOR PREPARING CURED FILMS, THE RESULTING CURED FILMS, ORGANIC EL DISPLAY DEVICES AND LIQUID CRYSTAL DISPLAY DEVICES
  申请人：FUJIFILM Corporation

  公开号：US20150148546A1

  公开（公告）日：2015-05-28

  Provided is a photosensitive resin composition having high sensitivity and storage stability. The photosensitive resin composition comprises (A) a polymer component including a polymer satisfying at least one of (1) and (2) below: (1) a polymer comprising (a1) a structural unit containing a group in which an acid group is protected by an acid-dissociable group, and (a2) a structural unit containing a crosslinkable group, and (2) a polymer comprising (a1) a structural unit containing a group in which an acid group is protected by an acid-dissociable group, and a polymer comprising (a2) a structural unit containing a crosslinkable group; (B) a compound represented by formula (I) below; and (C) a solvent;

  提供了一种具有高灵敏度和储存稳定性的光敏树脂组合物。该光敏树脂组合物包括(A)聚合物组分，包括满足以下至少一种的聚合物：(1)包含具有酸基被酸可解离基团保护的基团(a1)和含有可交联基团的基团(a2)的聚合物；(2)包含具有酸基被酸可解离基团保护的基团(a1)的聚合物和包含含有可交联基团的基团(a2)的聚合物；(B)由以下公式(I)表示的化合物；和(C)溶剂。
• PHOTOSENSITIVE TRANSFER MATERIAL, PATTERN FORMATION METHOD, AND ETCHING METHOD
  申请人：FUJIFILM Corporation

  公开号：US20150219993A1

  公开（公告）日：2015-08-06

  A photosensitive transfer material including a support, a thermoplastic resin layer, and a photosensitive resin composition layer in this order, in which the photosensitive resin composition layer includes a polymer component (A) including a polymer having a constituent unit (a1) that includes a group in which an acid group is protected by an acid-decomposable group and a photoacid generator (B).
• US9223211B2
  申请人：——

  公开号：US9223211B2

  公开（公告）日：2015-12-29
• US9810984B2
  申请人：——

  公开号：US9810984B2

  公开（公告）日：2017-11-07