申请人:WAKO PURE CHEMICAL INDUSTRIES, LTD.
公开号:EP0319325A2
公开(公告)日:1989-06-07
A photosensitive composition comprising a resin such as an alkali-soluble resin and a photosensitive compound such as a novel 3-diazo-2,4-dione derivative, a novel Meldrum's acid derivative, or the like is effective for forming a fine pattern using deep UV light of less than about 300 nm.
一种由树脂(如碱溶性树脂)和光敏化合物(如新型 3-重氮-2,4-二酮衍生物、新型梅氏酸衍生物等)组成的光敏组合物能有效地利用小于约 300 纳米的深紫外线形成精细图案。