申请人:SHIN-ETSU CHEMICAL CO., LTD.
公开号:US20160152755A1
公开(公告)日:2016-06-02
A resist composition comprising a polymer comprising recurring units of lactone and a PAG is provided. The resist composition has a high dissolution contrast during organic solvent development, and improved resist properties including MEF and CDU and forms a fine hole pattern with improved roundness and size control.