2-[2-(1-Adamantyl)acetyl]oxy-3,3,3-trifluoro-2-methylpropane-1-sulfonic acid

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 有机磺酸及其衍生物
• 英文名称: 2-[2-(1-Adamantyl)acetyl]oxy-3,3,3-trifluoro-2-methylpropane-1-sulfonic acid
• 英文别名: 2-[2-(1-adamantyl)acetyl]oxy-3,3,3-trifluoro-2-methylpropane-1-sulfonic acid
• 化学式: C₁₆H₂₃F₃O₅S
• 分子量: 384.4
• InChiKey: OVPIHQAWXCGFBX-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.8
• 重原子数：
  25
• 可旋转键数：
  6
• 环数：
  4.0
• sp3杂化的碳原子比例：
  0.94
• 拓扑面积：
  89
• 氢给体数：
  1
• 氢受体数：
  8

文献信息

• RESIST COMPOSITION, PATTERN FORMING PROCESS, POLYMER, AND MONOMER
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20170184967A1

  公开（公告）日：2017-06-29

  A polymer comprising recurring units containing a specific lactone ring and having an alkyl group on γ-butyrolactone skeleton of fused ring lactone and an alkyl ester substituent group intervening between the lactone structure and the polymer backbone is provided. A resist composition comprising the polymer as base resin is improved in such properties as DOF margin and MEF and quite effective for precise micropatterning.

  提供一种聚合物，其中包含含有特定内酯环的重复单元，并且在融合环内酯的γ-丁内酯骨架上具有烷基基团，以及在内酯结构和聚合物主链之间具有烷基酯取代基团。以该聚合物为基础树脂的抗蚀组合物在DOF边缘和MEF等性能方面得到改善，并且非常有效用于精确微图案化。
• COMPOUND, POLYMER COMPOUND, RESIST COMPOSITION, AND PATTERNING PROCESS
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20170038683A1

  公开（公告）日：2017-02-09

  The present invention provides a compound shown by the formula (1), wherein R 1 represents a hydrogen atom, a fluorine atom, a methyl group, or a trifluoromethyl group; A represents a single bond or a linear divalent hydrocarbon group having 1 to 30 carbon atoms or a branched or cyclic divalent hydrocarbon group having 3 to 30 carbon atoms, in which the hydrocarbon group may contain a heteroatom, and a part or all of hydrogen atoms in the hydrocarbon group may be substituted with a group containing a heteroatom; “n” represents 0 or 1, provided that “n” is 0 when A is a single bond; and M + represents a cation. This compound is suitable as a raw material of a polymer compound usable for a base resin of a resist composition that has high resolution and high sensitivity and is excellent in balance of lithography properties such as LWR and CDU.
• US9897916B2
  申请人：——

  公开号：US9897916B2

  公开（公告）日：2018-02-20