1,1-Difluoro-2-(3-oxocyclohexanecarbonyl)oxyethanesulfonic acid

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 有机磺酸及其衍生物
• 英文名称: 1,1-Difluoro-2-(3-oxocyclohexanecarbonyl)oxyethanesulfonic acid
• 英文别名: 1,1-difluoro-2-(3-oxocyclohexanecarbonyl)oxyethanesulfonic acid
• 化学式: C₉H₁₂F₂O₆S
• 分子量: 286.25
• InChiKey: QNMKBSHAVDYQKX-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  -0.1
• 重原子数：
  18
• 可旋转键数：
  5
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.78
• 拓扑面积：
  106
• 氢给体数：
  1
• 氢受体数：
  8

文献信息

• Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device
  申请人：FUJIFILM Corporation

  公开号：US10802399B2

  公开（公告）日：2020-10-13

  The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition which is capable of forming a pattern having a low LWR and is further suppressed in the collapse of the formed pattern, a resist film, a pattern forming method, and a method for manufacturing an electronic device. The actinic ray-sensitive or radiation-sensitive resin composition of the present invention contains a photoacid generator represented by General Formula (1) or a resin having a residue obtained by removing one hydrogen atom from the photoacid generator represented by General Formula (1).

  本发明提供了一种能够形成具有低低辐射倍率的图案并进一步抑制所形成图案的塌陷的光敏或辐射敏感树脂组合物、抗蚀薄膜、图案形成方法和电子设备的制造方法。本发明的光敏或辐射敏感树脂组合物含有通式(1)表示的光酸发生体或具有从通式(1)表示的光酸发生体中除去一个氢原子而得到的残余物的树脂。
• METHOD OF FORMING PATTERN, ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM, PROCESS FOR MANUFACTURING ELECTRONIC DEVICE AND ELECTRONIC DEVICE
  申请人：FUJIFILM CORPORATION

  公开号：US20160004157A1

  公开（公告）日：2016-01-07

  A method of forming a pattern includes (a) forming a film of an actinic-ray- or radiation-sensitive resin composition, (b) exposing the film to light, and (c) developing the exposed film with a developer comprising an organic solvent to thereby form a negative pattern. The actinic-ray- or radiation-sensitive resin composition includes (A) a resin whose solubility in the developer comprising an organic solvent is lowered when acted on by an acid, which resin contains a repeating unit with any of lactone structures of general formula (1) below, and (B) a compound that when exposed to actinic rays or radiation, generates an acid.
• US9551931B2
  申请人：——

  公开号：US9551931B2

  公开（公告）日：2017-01-24
• [EN] METHOD OF FORMING PATTERN, ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM, PROCESS FOR MANUFACTURING ELECTRONIC DEVICE AND ELECTRONIC DEVICE<br/>[FR] PROCÉDÉ DE FORMATION D'UN MOTIF, COMPOSITION DE RÉSINE SENSIBLE AUX RAYONS ACTINIQUES OU AUX RADIATIONS, FILM SENSIBLE AUX RAYONS ACTINIQUES OU AUX RADIATIONS, PROCESSUS DE FABRICATION D'UN DISPOSITIF ÉLECTRONIQUE ET DISPOSITIF ÉLECTRONIQUE
  申请人：FUJIFILM CORP

  公开号：WO2014142360A1

  公开（公告）日：2014-09-18

  According to one embodiment, a method of forming a pattern includes (a) forming a film of an actinic-ray- or radiation-sensitive resin composition, (b) exposing the film to light, and (c) developing the exposed film with a developer comprising an organic solvent to thereby form a negative pattern. The actinic-ray- or radiation-sensitive resin composition includes (A) a resin whose solubility in the developer comprising an organic solvent is lowered when acted on by an acid, which resin contains a repeating unit with any of lactone structures of general formula (1) below, and (B) a compound that when exposed to actinic rays or radiation, generates an acid.