1,1-Difluoro-2-(10-oxotricyclo[5.2.1.04,8]dec-3-ene-5-carbonyl)oxyethanesulfonic acid

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 有机磺酸及其衍生物
• 英文名称: 1,1-Difluoro-2-(10-oxotricyclo[5.2.1.04,8]dec-3-ene-5-carbonyl)oxyethanesulfonic acid
• 英文别名: 1,1-difluoro-2-(10-oxotricyclo[5.2.1.04,8]dec-3-ene-5-carbonyl)oxyethanesulfonic acid
• 化学式: C₁₃H₁₄F₂O₆S
• 分子量: 336.31
• InChiKey: KSMZBQAFVNJMAV-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  0.2
• 重原子数：
  22
• 可旋转键数：
  5
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.69
• 拓扑面积：
  106
• 氢给体数：
  1
• 氢受体数：
  8

文献信息

• [EN] METHOD OF FORMING PATTERN, ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM, PROCESS FOR MANUFACTURING ELECTRONIC DEVICE AND ELECTRONIC DEVICE<br/>[FR] PROCÉDÉ DE FORMATION D'UN MOTIF, COMPOSITION DE RÉSINE SENSIBLE AUX RAYONS ACTINIQUES OU AUX RADIATIONS, FILM SENSIBLE AUX RAYONS ACTINIQUES OU AUX RADIATIONS, PROCESSUS DE FABRICATION D'UN DISPOSITIF ÉLECTRONIQUE ET DISPOSITIF ÉLECTRONIQUE
  申请人：FUJIFILM CORP

  公开号：WO2014142360A1

  公开（公告）日：2014-09-18

  According to one embodiment, a method of forming a pattern includes (a) forming a film of an actinic-ray- or radiation-sensitive resin composition, (b) exposing the film to light, and (c) developing the exposed film with a developer comprising an organic solvent to thereby form a negative pattern. The actinic-ray- or radiation-sensitive resin composition includes (A) a resin whose solubility in the developer comprising an organic solvent is lowered when acted on by an acid, which resin contains a repeating unit with any of lactone structures of general formula (1) below, and (B) a compound that when exposed to actinic rays or radiation, generates an acid.