A composition for copper patterning and a method of copper patterning using the composition are provided, which composition is excellently safe in copper patterning, sintering at lower temperatures, and capable of forming a highly conducive copper pattern of a desired shape even on a plastic substrate. The composition contains Component A: a copper β-ketocarboxylate compound of formula (1):
(R1, R2: H or C1-C6 straight- or C3-C6 branched-hydrocarbon group, etc.); and based on 1 mol of this compound, Component B: an amine compound having a boiling point of not higher than 250° C. at 0.1 to 500 mol; and Component C-1: an organic acid having pKa of not more than 4 at 0.01 to 20 mol, and/or Component C-2: an organic copper compound composed of copper and an organic acid having pKa of not more than 4 at 0.01 to 100 mol. The composition is useful in the field of electronics.
提供了一种用于
铜图案制作的组合物和使用该组合物的
铜图案制作方法,该组合物在
铜图案制作中非常安全,在较低温度下烧结,并能够在塑料基板上形成所需形状的高导电性
铜图案。该组合物包含组分A:式(1)的
铜β-
酮酸盐化合物:(R1,R2:H或C1-C6直链或C3-C6支链烃基等);并且基于1摩尔该化合物,组分B:沸点不高于250℃的胺化合物,0.1至500摩尔;以及组分C-1:pKa不超过4的有机酸,0.01至20摩尔,和/或组分C-2:由
铜和pKa不超过4的有机酸组成的
有机铜化合物,0.01至100摩尔。该组合物在电子领域中非常有用。