2-Methyl-butyric acid 2-hydroxy-ethyl ester | 39522-85-5

• 分子结构分类: 有机化合物 - 脂质和类脂质分子 - 脂肪酰基
• 英文名称: 2-Methyl-butyric acid 2-hydroxy-ethyl ester
• 英文别名: 2-Hydroxyethyl 2-methylbutanoate
• CAS: 39522-85-5
• 化学式: C₇H₁₄O₃
• mdl: MFCD29950495
• 分子量: 146.186
• InChiKey: DTXFXGQIAKGOMN-UHFFFAOYSA-N

物化性质

• 沸点：
  228.4±13.0 °C(Predicted)
• 密度：
  1.005±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  0.8
• 重原子数：
  10
• 可旋转键数：
  5
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.857
• 拓扑面积：
  46.5
• 氢给体数：
  1
• 氢受体数：
  3

反应信息

• 作为产物：
  描述：

  1,2-Dimethyl-4,7-dioxa-spiro[2.4]heptane 在 sodium hydroxide 作用下， 生成 2-Methyl-butyric acid 2-hydroxy-ethyl ester
  参考文献：
  名称：

  Giusti,G., Bulletin de la Societe Chimique de France, 1972, p. 4335 - 4340

  摘要：

  DOI：

文献信息

• POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS
  申请人：NISHI Tsunehiro

  公开号：US20100062374A1

  公开（公告）日：2010-03-11

  A positive resist composition comprises (A) a resin component which becomes soluble in an alkaline developer under the action of an acid and (B) an acid generator. The resin (A) is a polymer comprising recurring units containing a non-leaving hydroxyl group represented by formula (1) wherein R 1 is H, methyl or trifluoromethyl, X is a single bond or methylene, m is 1 or 2, and the hydroxyl group attaches to a secondary carbon atom. The composition is improved in resolution when processed by lithography.

  一种正性光刻胶组合物包括（A）在酸的作用下在碱性显影剂中变得可溶的树脂组分和（B）酸发生剂。树脂（A）是一种聚合物，包含由式（1）表示的非离去羟基的重复单元，其中R1为H、甲基或三氟甲基，X为单键或亚甲基，m为1或2，并且羟基连接到次级碳原子。当通过光刻工艺处理时，该组合物在分辨率方面得到改善。
• MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：US20170131635A1

  公开（公告）日：2017-05-11

  A monomer of formula (1a) or (1b) is provided wherein A is a polymerizable group, R 1 -R 6 are monovalent hydrocarbon groups, X 1 is a divalent hydrocarbon group, Z 1 is an aliphatic group, Z 2 forms an alicyclic group, k=0 or 1, m=1 or 2, n=1 to 4. A useful polymer is obtained by polymerizing the monomer. A resist composition comprising the polymer has improved development properties and is processed to form a negative pattern having high contrast, high resolution and etch resistance which is insoluble in alkaline developer.

  提供了一个化学式为（1a）或（1b）的单体，其中A是一个可聚合的基团，R1-R6是一价碳氢基团，X1是一个二价碳氢基团，Z1是一个脂肪基团，Z2形成一个脂环基团，k=0或1，m=1或2，n=1到4。通过聚合单体得到了一种有用的聚合物。包含该聚合物的抗蚀组合物具有改善的显影性能，并且经过处理形成具有高对比度、高分辨率和耐蚀性的负图案，该负图案在碱性显影剂中不溶。
• ACID-LABILE ESTER MONOMER HAVING SPIROCYCLIC STRUCTURE, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS
  申请人：Kinsho Takeshi

  公开号：US20100304295A1

  公开（公告）日：2010-12-02

  An acid-labile ester monomer of spirocyclic structure has formula (1) wherein Z is a monovalent group having a polymerizable double bond, X is a divalent group which forms a cyclopentane, cyclohexane or norbornane ring, R 2 is H or monovalent hydrocarbon, R 3 and R 4 are H or monovalent hydrocarbon, or R 3 and R 4 , taken together, stand for a divalent group which forms a cyclopentane or cyclohexane ring, and n is 1 or 2. A polymer obtained from the acid-labile ester monomer has so high reactivity in acid-catalyzed elimination reaction that the polymer may be used to formulate a resist composition having high resolution.

  一种酸敏感酯单体具有螺环结构，其化学式如下（1），其中Z是具有可聚合双键的一价基团，X是形成环戊烷、环己烷或诺邦烷环的二价基团，R2是H或一价碳氢基团，R3和R4是H或一价碳氢基团，或者R3和R4一起表示形成环戊烷或环己烷环的二价基团，n为1或2。从酸敏感酯单体获得的聚合物在酸催化消除反应中具有很高的反应性，因此可以用于制备具有高分辨率的抗蚀组合物。
• FLUORINATED MONOMER, FLUORINATED POLYMER, RESIST COMPOSITION AND PATTERNING PROCESS
  申请人：HASEGAWA Koji

  公开号：US20090035699A1

  公开（公告）日：2009-02-05

  Fluorinated monomers of formula (1) are useful in producing polymers for the formulation of radiation-sensitive resist compositions. R 1 is H or monovalent C 1 -C 20 hydrocarbon group, R 2 is H, F, methyl or trifluoromethyl, R 3 and R 4 are H or a monovalent C 1 -C 8 hydrocarbon group, or R 3 and R 4 may form an aliphatic hydrocarbon ring, and A is a divalent C 1 -C 6 hydrocarbon group.

  式（1）的氟化单体在制备用于辐射敏感抗蚀组合物的聚合物方面很有用。 R1是H或一价的C1-C20碳氢基团，R2是H，F，甲基或三氟甲基，R3和R4是H或一价的C1-C8碳氢基团，或R3和R4可以形成脂肪烃环，A是二价的C1-C6碳氢基团。
• FLUOROALCOHOL, FLUORINATED MONOMER, POLYMER, RESIST COMPOSITION AND PATTERNING PROCESS
  申请人：HASEGAWA Koji

  公开号：US20120077121A1

  公开（公告）日：2012-03-29

  Fluoroalcohol compounds of formula (1) are useful in producing polymers which are used as the base resin to formulate radiation-sensitive resist compositions having transparency to radiation having a wavelength of up to 500 nm and improved development characteristics. R 1 is hydrogen or a monovalent C 1 -C 20 hydrocarbon group in which any constituent —CH 2 — moiety may be replaced by —O— or —C(═O)—, Aa is a (k 1 +1)-valent C 1 -C 20 hydrocarbon or fluorinated hydrocarbon group, and k 1 is 1, 2 or 3.

  公式（1）的氟醇化合物在生产用作基础树脂的聚合物方面很有用，这些聚合物用于配制对波长高达500纳米的辐射具有透明性和改进的开发特性的辐射敏感型光刻胶组合物。R1是氢或一价的C1-C20碳氢基团，在其中任何成分的—CH2—基团可以被—O—或—C(═O)—替代，Aa是(k1+1)-价的C1-C20碳氢基团或氟化碳氢基团，k1为1、2或3。