methylene-bis-tartronic acid | 163358-99-4

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 羧酸及其衍生物
• 英文名称: methylene-bis-tartronic acid
• 英文别名: Methylenebistartronic acid；1,3-dihydroxypropane-1,1,3,3-tetracarboxylic acid
• CAS: 163358-99-4
• 化学式: C₇H₈O₁₀
• 分子量: 252.135
• InChiKey: GYDFEFKLFKWLIK-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  -2.4
• 重原子数：
  17
• 可旋转键数：
  6
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.43
• 拓扑面积：
  190
• 氢给体数：
  6
• 氢受体数：
  10

反应信息

• 作为反应物：
  描述：

  methylene-bis-tartronic acid 、 重氮甲烷 以 甲醇 、 乙醚 为溶剂， 以22%的产率得到tetramethyl methylene-bis-tartronate
  参考文献：
  名称：

  Autoassembling of cage structures

  摘要：

  Treatment of alkylenebismalonates with NaH and benzoyl peroxide afforded dibenzoyloxy derivatives. Alkaline hydrolysis of the latter gave alkylenebistartronic acids. Tetramethyl and tetraethyl esters and tetraamides of these acids were synthesized.

  DOI：

  10.1007/bf00700172
• 作为产物：
  描述：

  tetraethyl methylenebisbenzoyloxymalonate 在 氢氧化钾 作用下， 以 甲醇 、 水 为溶剂， 反应 18.0h， 生成 methylene-bis-tartronic acid
  参考文献：
  名称：

  Autoassembling of cage structures

  摘要：

  Treatment of alkylenebismalonates with NaH and benzoyl peroxide afforded dibenzoyloxy derivatives. Alkaline hydrolysis of the latter gave alkylenebistartronic acids. Tetramethyl and tetraethyl esters and tetraamides of these acids were synthesized.

  DOI：

  10.1007/bf00700172

文献信息

• Autoassembly of cage structures
  作者：R. G. Kostyanovsky、Yu. I. El'natanov、O. N. Krutius、I. I. Chervin

  DOI：10.1007/bf00696323

  日期：1994.11

  Methylene-bis-tartronates and methylene-bis-hydroxymethylmalonates form monolactones where the CO(2)R and OH (or CH2OH) groups are known to be cis-oriented. However, attempts to prepare the corresponding dilactones failed due to the unsufficient proximity of these functional groups. The results have been confirmed by NMR spectra.
• Kostjanowskiii R. G., Elnatanow Ju. I., Krutius O. N., Isw. AN. Ser. khim., (1994) N 12, S 2190-2193
  作者：Kostjanowskiii R. G., Elnatanow Ju. I., Krutius O. N.

  DOI：——

  日期：——
• CLEANING FORMULATION FOR REMOVING RESIDUES ON SURFACES
  申请人：Du Bing

  公开号：US20120048295A1

  公开（公告）日：2012-03-01

  This disclosure relates to compositions that can be used to remove residues from a semiconductor substrate.
• [EN] CLEANING FORMULATION FOR REMOVING RESIDUES ON SURFACES<br/>[FR] FORMULATION DE NETTOYAGE POUR ÉLIMINER LES RÉSIDUS DE SURFACES
  申请人：FUJIFILM ELECTRONIC MATERIALS

  公开号：WO2010104816A1

  公开（公告）日：2010-09-16

  This disclosure relates to compositions that can be used to remove residues from a semiconductor substrate.
• Autoassembling of cage structures
  作者：R. G. Kostyanovsky、Yu. I. El'natanov、O. N. Krutius

  DOI：10.1007/bf00700172

  日期：1994.12

  Treatment of alkylenebismalonates with NaH and benzoyl peroxide afforded dibenzoyloxy derivatives. Alkaline hydrolysis of the latter gave alkylenebistartronic acids. Tetramethyl and tetraethyl esters and tetraamides of these acids were synthesized.