(6-Hydroxy-1-pentacyclo[7.3.1.14,12.02,7.06,11]tetradecanyl) 2-tert-butyl-4,4-dimethylpentanoate

• 分子结构分类: 有机化合物 - 脂质和类脂质分子 - 脂肪酰基
• 英文名称: (6-Hydroxy-1-pentacyclo[7.3.1.14,12.02,7.06,11]tetradecanyl) 2-tert-butyl-4,4-dimethylpentanoate
• 英文别名: (6-hydroxy-1-pentacyclo[7.3.1.14,12.02,7.06,11]tetradecanyl) 2-tert-butyl-4,4-dimethylpentanoate
• 化学式: C₂₅H₄₀O₃
• 分子量: 388.6
• InChiKey: JVCYLWUEWRFODT-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  5.5
• 重原子数：
  28
• 可旋转键数：
  6
• 环数：
  7.0
• sp3杂化的碳原子比例：
  0.96
• 拓扑面积：
  46.5
• 氢给体数：
  1
• 氢受体数：
  3

文献信息

• Pattern forming method, composition for forming protective film, method for manufacturing electronic device, and electronic device
  申请人：FUJIFILM Corporation

  公开号：US10175578B2

  公开（公告）日：2019-01-08

  A pattern forming method includes coating an actinic ray-sensitive or radiation-sensitive resin composition onto a substrate to form an actinic ray-sensitive or radiation-sensitive film, coating a composition for forming a protective film onto the actinic ray-sensitive or radiation-sensitive film to form a protective film, exposing the actinic ray-sensitive or radiation-sensitive film covered with the protective film, and developing the exposed actinic ray-sensitive or radiation-sensitive film using a developer containing an organic solvent, in which the protective film contains a compound (A) including at least one group or bond selected from the group consisting of an ether bond, a thioether bond, a hydroxyl group, a thiol group, a carbonyl bond, and an ester bond, and a resin (X).

  一种图案形成方法包括将感光或感辐射树脂组合物涂布到基底上以形成感光或感辐射胶片，将用于形成保护膜的组合物涂布到感光或感辐射胶片上以形成保护膜，曝光覆盖有保护膜的感光或感辐射胶片、使用含有有机溶剂的显影剂对曝光的感光胶片或辐射敏感胶片进行显影，其中保护膜含有一种化合物 (A)，该化合物包括至少一个选自由醚键、硫醚键、羟基、硫醇基、羰基键和酯键组成的基团或键，以及一种树脂 (X)。
• PATTERN FORMING METHOD, COMPOSITION FOR FORMING PROTECTIVE FILM, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE
  申请人：FUJIFILM Corporation

  公开号：US20170176862A1

  公开（公告）日：2017-06-22

  A pattern forming method includes coating an actinic ray-sensitive or radiation-sensitive resin composition onto a substrate to form an actinic ray-sensitive or radiation-sensitive film, coating a composition for forming a protective film onto the actinic ray-sensitive or radiation-sensitive film to form a protective film, exposing the actinic ray-sensitive or radiation-sensitive film covered with the protective film, and developing the exposed actinic ray-sensitive or radiation-sensitive film using a developer containing an organic solvent, in which the protective film contains a compound (A) including at least one group or bond selected from the group consisting of an ether bond, a thioether bond, a hydroxyl group, a thiol group, a carbonyl bond, and an ester bond, and a resin (X).
• METHOD FOR MANUFACTURING ELECTRONIC DEVICE
  申请人：FUJIFILM Corporation

  公开号：US20220121123A1

  公开（公告）日：2022-04-21

  A method for manufacturing an electronic device, the method including performing a treatment using a treatment liquid for manufacturing a semiconductor, the treatment liquid for manufacturing a semiconductor includes: a quaternary ammonium compound represented by the following Formula (N); at least one additive selected from the group consisting of an anionic surfactant, a nonionic surfactant, a cationic surfactant, and a chelating agent; water; and one kind or two or more kinds of metal atoms selected from the group consisting of Na, K, Ca, Fe, Cu, Mg, Mn, Li, Al, Cr, Ni, and Zn. A ratio T 1 of a total mass of the metal atoms to the sum of a total mass of the additive and the total mass of the metal atoms is in a range from 1 ppt to 1 ppm.
• US9709891B2
  申请人：——

  公开号：US9709891B2

  公开（公告）日：2017-07-18