2-(Dimethylamino)ethyl 2-methyl-4-phenylbut-2-enoate

• 分子结构分类: 有机化合物 - 脂质和类脂质分子 - 脂肪酰基
• 英文名称: 2-(Dimethylamino)ethyl 2-methyl-4-phenylbut-2-enoate
• 英文别名: 2-(dimethylamino)ethyl 2-methyl-4-phenylbut-2-enoate
• 化学式: C₁₅H₂₁NO₂
• 分子量: 247.33
• InChiKey: ASRCAGAIDKJGSH-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.9
• 重原子数：
  18
• 可旋转键数：
  7
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.4
• 拓扑面积：
  29.5
• 氢给体数：
  0
• 氢受体数：
  3

文献信息

• SELF-STOPPING POLISHING COMPOSITION AND METHOD
  申请人：CMC Materials, Inc.

  公开号：US20210115301A1

  公开（公告）日：2021-04-22

  A chemical mechanical polishing composition for polishing a substrate having a silicon oxygen material comprises, consists of, or consists essentially of a liquid carrier, cubiform ceria abrasive particles dispersed in the liquid carrier, a self-stopping agent, and a cationic polymer.
• [EN] SELF-STOPPING POLISHING COMPOSITION AND METHOD<br/>[FR] COMPOSITION ET PROCÉDÉ DE POLISSAGE À ARRÊT AUTOMATIQUE
  申请人：CMC MAT INC

  公开号：WO2021081171A1

  公开（公告）日：2021-04-29

  A chemical mechanical polishing composition for polishing a substrate having a silicon oxygen material comprises, consists of, or consists essentially of a liquid carrier, cubiform ceria abrasive particles dispersed in the liquid carrier, a self-stopping agent, and a cationic polymer.