[[2,2-Difluoro-1-(4-methoxyphenyl)-2-methylsulfonylethylidene]amino] ethanesulfonate

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯酚醚
• 英文名称: [[2,2-Difluoro-1-(4-methoxyphenyl)-2-methylsulfonylethylidene]amino] ethanesulfonate
• 英文别名: [[2,2-difluoro-1-(4-methoxyphenyl)-2-methylsulfonylethylidene]amino] ethanesulfonate
• 化学式: C₁₂H₁₅F₂NO₆S₂
• 分子量: 371.4
• InChiKey: VFWZOMITLAUWFA-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.2
• 重原子数：
  23
• 可旋转键数：
  7
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.42
• 拓扑面积：
  116
• 氢给体数：
  0
• 氢受体数：
  9

文献信息

• RADIATION-SENSITIVE RESIN COMPOSITION
  申请人：JSR Corporation

  公开号：EP1726608A1

  公开（公告）日：2006-11-29

  A siloxane resin exhibiting high transparency at a wavelength of 193 nm or less, very suitable as a resin component in a radiation-sensitive resin composition useful particularly for manufacturing LSIs, and a radiation-sensitive resin composition useful as a chemically-amplified resist exhibiting excellent depth of focus (DOF) and capability of remarkably decreasing development defects are provided. The siloxane resin comprises the structural unit (I) shown by the following formula (I) and the structural unit (II) shown by the following formula (II) in the same molecule, the structural unit (I) and the structural unit (II) being included in an amount of more than 0 mol% but not more than 70 mol%, wherein A and B individually represents a divalent linear, branched, or cyclic hydrocarbon group, R1 represents a monovalent acid-dissociable group, and R2 represents a linear, branched, or cyclic alkyl group. The radiation-sensitive resin composition comprises (a) the siloxane resin and (b) a photoacid generator.

  本发明提供了一种在 193 纳米或更低波长下具有高透明度的硅氧烷树脂，它非常适合用作特别是用于制造 LSI 的辐射敏感树脂组合物中的树脂成分，还提供了一种用作化学放大抗蚀剂的辐射敏感树脂组合物，它具有优异的焦深（DOF）和显著减少显影缺陷的能力。 硅氧烷树脂在同一分子中包含下式（I）所示的结构单元（I）和下式（II）所示的结构单元（II），结构单元（I）和结构单元（II）的含量超过 0 摩尔%，但不超过 70 摩尔%、 其中 A 和 B 分别代表二价直链、支链或环状烃基，R1 代表一价酸可分解基团，R2 代表直链、支链或环状烷基。 辐射敏感树脂组合物包括 (a) 硅氧烷树脂和 (b) 光酸发生器。
• Radiation sensitive resin composition
  申请人：Nishimura Isao

  公开号：US20050171226A1

  公开（公告）日：2005-08-04

  A radiation-sensitive resin composition comprising (A) a resin containing a structural unit of the following formula (I), (B) a resin containing a recurring unit of the following formula (II), and (C) a photoacid generator, wherein R 1 represents a substituted or unsubstituted divalent (alicyclic) hydrocarbon, R 2 represents a lower alkyl group or a monovalent (substituted) alicyclic hydrocarbon group, or any two R 2 s form in combination a divalent (substituted) alicyclic hydrocarbon group, with the remaining R 2 being a lower alkyl group or a monovalent (substituted) alicyclic hydrocarbon group, wherein R 3 represents a hydrogen atom, fluorine atom, or trifluoromethyl group, R 4 represents a (substituted) hydrocarbon group with a valence of (c+1), (substituted) alicyclic hydrocarbon with a valence of (c+1), or (substituted) aromatic group with a valence of (c+1), R 5 represents a hydrogen atom or a monovalent acid-dissociable group, a and b individually represent an integer of 0-3, provided that (a+b)≧1 is satisfied, and c is an integer of 1-3. The radiation-sensitive resin composition has a high transparency at a wavelength of 193 nm or less and is particularly excellent in LER.
• Radiation-Sensitive Resin Composition
  申请人：Nishimura Isao

  公开号：US20070269735A1

  公开（公告）日：2007-11-22

  A siloxane resin exhibiting high transparency at a wavelength of 193 nm or less, very suitable as a resin component in a radiation-sensitive resin composition useful particularly for manufacturing LSIs, and a radiation-sensitive resin composition useful as a chemically-amplified resist exhibiting excellent depth of focus (DOF) and capability of remarkably decreasing development defects are provided. The siloxane resin comprises the structural unit (I) shown by the following formula (I) and the structural unit (II) shown by the following formula (II) in the same molecule, the structural unit (I) and the structural unit (II) being included in an amount of more than 0 mol % but not more than 70 mol %, wherein A and B individually represents a divalent linear, branched, or cyclic hydrocarbon group, R 1 represents a monovalent acid-dissociable group, and R 2 represents a linear, branched, or cyclic alkyl group. The radiation-sensitive resin composition comprises (a) the siloxane resin and (b) a photoacid generator.
• US6824954B2
  申请人：——

  公开号：US6824954B2

  公开（公告）日：2004-11-30
• US7297461B2
  申请人：——

  公开号：US7297461B2

  公开（公告）日：2007-11-20