[(4-Chlorophenyl)-diphenyl-lambda4-sulfanyl] trifluoromethanesulfonate

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 有机磺酸及其衍生物
• 英文名称: [(4-Chlorophenyl)-diphenyl-lambda4-sulfanyl] trifluoromethanesulfonate
• 英文别名: [(4-chlorophenyl)-diphenyl-λ4-sulfanyl] trifluoromethanesulfonate
• 化学式: C₁₉H₁₄ClF₃O₃S₂
• 分子量: 446.9
• InChiKey: AWGHPZWIZXFAFM-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  7
• 重原子数：
  28
• 可旋转键数：
  5
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.05
• 拓扑面积：
  52.8
• 氢给体数：
  0
• 氢受体数：
  7

文献信息

• Process for producing triarylsulfonium salt
  申请人：Sumino Motoshige

  公开号：US20070083060A1

  公开（公告）日：2007-04-12

  [Subject] To provide a method for effectively producing a triarylsulfonium salt having a structure that only one aromatic ring of three aromatic rings on the cation portion thereof is different from the other two aromatic rings (hereinafter, abbreviated as a triarylsulfonium salt relating to the present invention) in a high yield without forming any byproduct. [Means for Solution Problems] The present invention relates to a method for producing a triarylsulfonium salt represented by the general formula [4]: wherein, two R 1 's represent each hydrogen atom, halogen atom, alkyl group, lower haloalkyl group, alkoxy group, acyl group, hydroxyl group, amino group, nitro group or cyano group; R represents an aryl group which may have a substituent selected from a halogen atom, an alkyl group, a lower haloalkyl group, an alkoxy group, an alkylthio group, a N-alkylcarbamoyl group and a carbamoyl group, and the above substituent is different from one represented by the above R 1 ; and A 1 represents a strong acid residue, comprising reacting a diaryl sulfoxide represented by the general formula [1]: wherein, R 1 represents the same as above, and an aryl Grignard reagent represented by the general formula [2]: RMgX   [2] wherein, X represents a halogen atom; R represents the same as above, in the presence of an activator with high affinity for oxygen of 3 to 7.5 equivalents relative to the above diaryl sulfoxide, and then reacting the resultant reaction mixture with a strong acid represented by the general formula [3]: HA 1 [3] wherein, A 1 represents the same as above, or a salt thereof.

  [主题] 提供一种有效地生产三芳基硫鎓盐的方法，其结构中阳离子部分的三个芳环中仅有一个芳环与另外两个芳环不同（以下简称与本发明有关的三芳基硫鎓盐），高产率地生产三芳基硫鎓盐而不产生任何副产物。 [解决问题的方法] 本发明涉及一种生产由一般式[4]表示的三芳基硫鎓盐的方法： 其中，两个R1分别代表氢原子、卤素原子、烷基、较低的卤代烷基、烷氧基、酰基、羟基、氨基、硝基或氰基；R代表芳基，该芳基可以具有从卤素原子、烷基、较低的卤代烷基、烷氧基、烷硫基、N-烷基氨甲酰基和氨甲酰基中选择的取代基，上述取代基与上述R1所代表的取代基不同；A1代表强酸残基。 该方法包括在高亲氧活化剂存在下，使一由一般式[1]表示的二芳基亚砜： 其中，R1代表与上述相同，以及由一般式[2]表示的芳基格氏试剂反应： RMgX   [2] 其中，X代表卤素原子；R代表与上述相同，然后将所得反应混合物与一由一般式[3]表示的强酸： HA1[3] 其中，A1代表与上述相同或其盐反应。
• PROCESS FOR PRODUCING TRIARYLSULFONIUM SALT
  申请人：Wako Pure Chemical Industries, Ltd.

  公开号：EP1676835B1

  公开（公告）日：2014-12-10
• New acid-labile group protected hydroxystyrene polymers or copolymers thereof and their application to radiation sensitive materials
  申请人：Clariant Finance (BVI) Limited

  公开号：EP0827970B1

  公开（公告）日：2001-09-26
• EP1257879A4
  申请人：——

  公开号：EP1257879A4

  公开（公告）日：2004-03-17
• RADIATION SENSITIVE COPOLYMERS, PHOTORESIST COMPOSITIONS THEREOF AND DEEP UV BILAYER SYSTEMS THEREOF
  申请人：FujiFilm Electronic Materials USA, Inc.

  公开号：EP1257879B1

  公开（公告）日：2007-04-18