[(4-Methylphenyl)-diphenyl-lambda4-sulfanyl] trifluoromethanesulfonate

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 有机磺酸及其衍生物
• 英文名称: [(4-Methylphenyl)-diphenyl-lambda4-sulfanyl] trifluoromethanesulfonate
• 英文别名: [(4-methylphenyl)-diphenyl-λ4-sulfanyl] trifluoromethanesulfonate
• 化学式: C₂₀H₁₇F₃O₃S₂
• 分子量: 426.5
• InChiKey: DKMYODGRKXERKJ-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  6.8
• 重原子数：
  28
• 可旋转键数：
  5
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.1
• 拓扑面积：
  52.8
• 氢给体数：
  0
• 氢受体数：
  7

反应信息

• 作为产物：
  描述：

  三氟甲磺酸三甲基硅酯 生成 [(4-Methylphenyl)-diphenyl-lambda4-sulfanyl] trifluoromethanesulfonate
  参考文献：
  名称：

  MILLER, ROBERT D.

  摘要：

  DOI：

文献信息

• RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYPHENOLIC COMPOUND FOR USE IN THE COMPOSITION, AND ALCOHOLIC COMPOUND THAT CAN BE DERIVED THEREFROM
  申请人：Mitsubishi Gas Chemical Company, Inc.

  公开号：US20160145231A1

  公开（公告）日：2016-05-26

  A resist composition containing a compound represented by the general formula (1) or (2), a method for forming a resist pattern using the composition, a polyphenolic compound for use in the composition, and an alcoholic compound that can be derived therefrom are described.

  描述了一种包含由通式（1）或（2）表示的化合物的光刻胶组合物，使用该组合物形成光刻胶图案的方法，用于该组合物的多酚化合物，以及可以由其衍生的醇化合物。
• RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUND, AND ACID GENERATOR
  申请人：HADA Hideo

  公开号：US20120264061A1

  公开（公告）日：2012-10-18

  A resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) including a compound represented by (b1-1), a compound represented by (b1-1′) and/or a compound represented by (b1-1″) (R 1 ″-R 3 ″ represents an aryl group or an alkyl group, provided that at least one of R 1 ″-R 3 ″ represents a substituted aryl group being substituted with a group represented by (b1-1-0), and two of R 1 ″-R 3 ″ may be mutually bonded to form a ring with the sulfur atom; X represents a C 3 -C 30 hydrocarbon group; Q 1 represents a carbonyl group-containing divalent linking group; X 10 represents a C 1 -C 30 hydrocarbon group; Q 3 represents a single bond or a divalent linking group; Y 10 represents —C(═O)— or —SO 2 —; Y 11 represents a C 1 -C 10 alkyl group or a fluorinated alkyl group: Q 2 represents a single bond or an alkylene group; and W represents a C 2 -C 10 alkylene group).

  一种抗蚀组合物，包括在酸和酸发生剂组分（B）的作用下，在碱性显影溶液中表现出改变溶解性的基础组分（A），所述酸发生剂组分（B）包括由（b1-1）表示的化合物，由（b1-1'）表示的化合物和/或由（b1-1''）表示的化合物（R1''-R3''表示芳基或烷基，但至少其中一个R1''-R3''表示被(b1-1-0)表示的基团取代的取代芳基，且其中两个R1''-R3''可以相互键合以形成与硫原子形成环的环；X表示C3-C30烃基；Q1表示含有羰基的二价连接基团；X10表示C1-C30烃基；Q3表示单键或二价连接基团；Y10表示—C(═O)—或—SO2—；Y11表示C1-C10烷基或氟代烷基；Q2表示单键或烷基基团；W表示C2-C10烷基基团。
• OPTICAL COMPONENT FORMING COMPOSITION AND CURED PRODUCT THEREOF
  申请人：Mitsubishi Gas Chemical Company, Inc.

  公开号：US20200262787A1

  公开（公告）日：2020-08-20

  The present invention provides an optical component forming composition comprising a tellurium-containing compound or a tellurium-containing resin.

  本发明提供了一种包括含碲化合物或含碲树脂的光学元件成型组合物。
• NOVEL COMPOUND
  申请人：UTSUMI Yoshiyuki

  公开号：US20120149916A1

  公开（公告）日：2012-06-14

  A compound represented by general formula (c1) (R 1 represents an alicyclic group of 5 or more carbon atoms which may have a substituent; X represents a divalent linking group; Y represents a linear, branched or cyclic alkylene group or an arylene group; Rf represents a hydrocarbon group containing a fluorine atom; and M + represents an organic cation or a metal cation).

  一个由一般公式表示的化合物（c1）（R1代表一个含有5个或更多碳原子的脂环基团，可能带有取代基; X代表双价连接基团; Y代表线性、支链或环烷基团或芳基团; Rf代表含有氟原子的烃基团; M+代表有机阳离子或金属阳离子）。
• Resist composition, method of forming resist pattern, novel compound, and acid generator
  申请人：Kawaue Akiya

  公开号：US20100136478A1

  公开（公告）日：2010-06-03

  A resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) including an acid generator (B1) containing a compound having a cation moiety represented by general formula (I) (in the formula, R 5 represents an organic group having a carbonyl group, an ester bond or a sulfonyl group; and Q represents a divalent linking group).

  一种抗蚀组合物，包括在酸发生剂的作用下在碱性显影溶液中表现出改变溶解度的基础组分（A）和在暴露后产生酸的酸发生剂组分（B），酸发生剂组分（B）包括含有由通式（I）表示的阳离子基团的化合物的酸发生剂（B1）（在该式中，R5代表具有羰基、酯键或磺酰基的有机基团；Q代表二价连接基团）。