[(4-Fluorophenyl)-diphenyl-lambda4-sulfanyl] trifluoromethanesulfonate

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 有机磺酸及其衍生物
• 英文名称: [(4-Fluorophenyl)-diphenyl-lambda4-sulfanyl] trifluoromethanesulfonate
• 英文别名: [(4-fluorophenyl)-diphenyl-λ4-sulfanyl] trifluoromethanesulfonate
• 化学式: C₁₉H₁₄F₄O₃S₂
• 分子量: 430.4
• InChiKey: VTKYEKOXEMBETI-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  6.5
• 重原子数：
  28
• 可旋转键数：
  5
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.05
• 拓扑面积：
  52.8
• 氢给体数：
  0
• 氢受体数：
  8

文献信息

• RADIATION-SENSITIVE RESIN COMPOSITION, MONOMER, POLYMER, AND PRODUCTION METHOD OF RADIATION-SENSITIVE RESIN COMPOSITION
  申请人：MARUYAMA Ken

  公开号：US20120237876A1

  公开（公告）日：2012-09-20

  A radiation-sensitive resin composition includes a solvent and a polymer. The polymer includes a repeating unit represented by a formula (I), a repeating unit represented by a formula (II), or a both thereof. Each of R 1 to R 3 independently represents a hydroxyl group, or the like. At least one of R 1 represents a group having two or more heteroatoms. l is an integer from 1 to 5. Each of m and n is independently an integer from 0 to 5. Each of R 7 and R 11 independently represents a hydrogen atom, or the like. Each of R 8 to R 10 independently represents a hydrogen atom, or the like. A represents —O—, or the like. D represents a substituted or unsubstituted methylene group, or the like.

  一种辐射敏感树脂组合物包括溶剂和聚合物。该聚合物包括由式(I)表示的重复单元，由式(II)表示的重复单元，或两者兼有。R1至R3中的每一个独立地表示一个羟基或类似物。其中至少一个R1表示具有两个或更多杂原子的基团。l是从1到5的整数。m和n中的每一个独立地是从0到5的整数。R7和R11中的每一个独立地表示氢原子或类似物。R8到R10中的每一个独立地表示氢原子或类似物。A表示—O—或类似物。D表示取代或未取代的亚甲基基团或类似物。
• Process for producing triarylsulfonium salt
  申请人：Sumino Motoshige

  公开号：US20070083060A1

  公开（公告）日：2007-04-12

  [Subject] To provide a method for effectively producing a triarylsulfonium salt having a structure that only one aromatic ring of three aromatic rings on the cation portion thereof is different from the other two aromatic rings (hereinafter, abbreviated as a triarylsulfonium salt relating to the present invention) in a high yield without forming any byproduct. [Means for Solution Problems] The present invention relates to a method for producing a triarylsulfonium salt represented by the general formula [4]: wherein, two R 1 's represent each hydrogen atom, halogen atom, alkyl group, lower haloalkyl group, alkoxy group, acyl group, hydroxyl group, amino group, nitro group or cyano group; R represents an aryl group which may have a substituent selected from a halogen atom, an alkyl group, a lower haloalkyl group, an alkoxy group, an alkylthio group, a N-alkylcarbamoyl group and a carbamoyl group, and the above substituent is different from one represented by the above R 1 ; and A 1 represents a strong acid residue, comprising reacting a diaryl sulfoxide represented by the general formula [1]: wherein, R 1 represents the same as above, and an aryl Grignard reagent represented by the general formula [2]: RMgX   [2] wherein, X represents a halogen atom; R represents the same as above, in the presence of an activator with high affinity for oxygen of 3 to 7.5 equivalents relative to the above diaryl sulfoxide, and then reacting the resultant reaction mixture with a strong acid represented by the general formula [3]: HA 1 [3] wherein, A 1 represents the same as above, or a salt thereof.

  [主题] 提供一种有效地生产三芳基硫鎓盐的方法，其结构中阳离子部分的三个芳环中仅有一个芳环与另外两个芳环不同（以下简称与本发明有关的三芳基硫鎓盐），高产率地生产三芳基硫鎓盐而不产生任何副产物。 [解决问题的方法] 本发明涉及一种生产由一般式[4]表示的三芳基硫鎓盐的方法： 其中，两个R1分别代表氢原子、卤素原子、烷基、较低的卤代烷基、烷氧基、酰基、羟基、氨基、硝基或氰基；R代表芳基，该芳基可以具有从卤素原子、烷基、较低的卤代烷基、烷氧基、烷硫基、N-烷基氨甲酰基和氨甲酰基中选择的取代基，上述取代基与上述R1所代表的取代基不同；A1代表强酸残基。 该方法包括在高亲氧活化剂存在下，使一由一般式[1]表示的二芳基亚砜： 其中，R1代表与上述相同，以及由一般式[2]表示的芳基格氏试剂反应： RMgX   [2] 其中，X代表卤素原子；R代表与上述相同，然后将所得反应混合物与一由一般式[3]表示的强酸： HA1[3] 其中，A1代表与上述相同或其盐反应。
• RADIATION-SENSITIVE COMPOSITION AND PROCESS FOR PRODUCING LOW-MOLECULAR COMPOUND FOR USE THEREIN
  申请人：Matsumura Nobuji

  公开号：US20090280433A1

  公开（公告）日：2009-11-12

  A radiation-sensitive composition contains (A) a low-molecular-weight compound having one or more acid-dissociable groups which decompose by the action of an acid to enhance solubility in an alkaline developing solution and one or more radiation-sensitive acid-generating groups which generate an acid upon application of an active ray or radiation per molecule, and having a polystyrene-reduced number-average molecular weight (Mn) measured by gel permeation chromatography (GPC) of 500 to 4,000, and (B) a solvent.

  一种辐射敏感组合物包含（A）低分子量化合物，其具有一个或多个酸解离基团，该基团在酸作用下分解，以增强其在碱性显影液中的溶解性，并且每个分子具有一个或多个辐射敏感酸生成基团，该基团在施加活性射线或辐射时产生酸，并且其聚苯乙烯还原平均分子量（Mn）通过凝胶渗透色谱（GPC）测量为500至4,000，并且（B）溶剂。
• RADIATION-SENSITIVE COMPOSITION
  申请人：JSR Corporation

  公开号：US20130108962A1

  公开（公告）日：2013-05-02

  A radiation-sensitive composition includes a low-molecular-weight compound, a solvent and a radiation-sensitive acid-generator other than the low-molecular-weight compound. The low-molecular-weight compound has one or more acid-dissociable groups which decompose by an action of an acid to enhance solubility in an alkaline developing solution and one or more radiation-sensitive acid-generating groups which generate an acid upon application of an active ray or radiation per molecule. The low-molecular-weight compound has a polystyrene-reduced number-average molecular weight (Mn) measured by gel permeation chromatography (GPC) of 500 to 4,000. The low-molecular-weight compound is not obtained from chain growth polymerization of a monomer with an unsaturated bond. A content of the low-molecular-weight compound is 80 mass % or more of 100 mass % of a total solid component of the radiation-sensitive composition. The low-molecular-weight compound is a compound shown by a following formula (1).

  一种辐射敏感组合物包括低分子量化合物、溶剂和除低分子量化合物外的辐射敏感酸发生剂。低分子量化合物具有一个或多个酸可解离基团，这些基团在酸的作用下分解，增强在碱性显影液中的溶解度，以及一个或多个辐射敏感酸生成基团，每个分子在施加活性射线或辐射时生成酸。低分子量化合物的聚苯乙烯还原数平均分子量（Mn）通过凝胶渗透色谱（GPC）测量为500至4,000。低分子量化合物不是从具有不饱和键的单体的链生长聚合中获得的。低分子量化合物的含量是辐射敏感组合物的100质量％的总固体成分的80质量％或更多。低分子量化合物是以下公式（1）所示的化合物。
• Radiation-sensitive resin composition
  申请人：JSR Corporation

  公开号：EP1686424A2

  公开（公告）日：2006-08-02

  A radiation-sensitive resin composition is provided which exhibits improved resolution, sensitivity, and focal depth allowance (process margin) and can eliminate development residues when forming a resist pattern. The radiation-sensitive resin composition comprises an acid-labile group-containing resin (A) which is insoluble or scarcely soluble in alkali, but becomes alkali soluble by the action of an acid, and a photoacid generator (B), the acid-labile group-containing resin (A) comprises a copolymer prepared by anionic polymerization of monomers including a substituted or unsubstituted styrene and have a terminal shown by the following formula (x). wherein R14 and R15 individually represent a hydrogen atom or a linear or branched saturated hydrocarbon group having 1-6 carbon atoms.

  本发明提供了一种辐射敏感树脂组合物，它具有更高的分辨率、灵敏度和焦深余量（工艺余量），并能在形成抗蚀剂图案时消除显影残留。该辐射敏感树脂组合物包括不溶于碱或几乎不溶于碱，但在酸的作用下可溶于碱的含酸基团树脂（A）和光酸发生器（B），含酸基团树脂（A）包括由包括取代或未取代苯乙烯的单体阴离子聚合制备的共聚物，具有下式（x）所示的末端。 其中 R14 和 R15 分别代表氢原子或具有 1-6 个碳原子的直链或支链饱和烃基。