[Problem]
To provide a composition capable of improving surface roughness of resist patterns, and also to provide a pattern formation method employing the composition.
[Solution]
The present invention provides a composition containing a particular nitrogen-containing compound, an anionic surfactant having a sulfo group, and water; and also provides a pattern formation method containing a step of applying the composition to a resist pattern beforehand developed and dried.
问题
提供一种能够改善抗蚀剂图案表面粗糙度的组合物,并提供一种使用该组合物的图案形成方法。
[解决方案]
本发明提供了一种含有特定
含氮化合物、具有磺基的阴离子表面活性剂和
水的组合物;还提供了一种图案形成方法,其中包含将该组合物用于事先显影和干燥的光刻胶图案的步骤。