acrylic acid-(β,β,β-trifluoro-isopropyl ester) | 2993-31-9

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 羧酸及其衍生物
• 英文名称: acrylic acid-(β,β,β-trifluoro-isopropyl ester)
• 英文别名: Acrylsaeure-(β,β,β-trifluor-isopropylester)；2-Acryloyloxy-1,1,1-trifluor-propan；1,1,1-Trifluoropropan-2-yl prop-2-enoate
• CAS: 2993-31-9
• 化学式: C₆H₇F₃O₂
• 分子量: 168.116
• InChiKey: KTQBOMAVUDZQFO-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.3
• 重原子数：
  11
• 可旋转键数：
  3
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.5
• 拓扑面积：
  26.3
• 氢给体数：
  0
• 氢受体数：
  5

反应信息

• 作为产物：
  描述：

  1,1,1-三氟异丙醇 、 丙烯酰氯 生成 acrylic acid-(β,β,β-trifluoro-isopropyl ester)
  参考文献：
  名称：

  Coleman et al., Journal of Chemical and Engineering Data, 1958, vol. 3, p. 113

  摘要：

  DOI：

文献信息

• Production processes and systems, compositions, surfactants, monomer units, metal complexes, phosphate esters, glycols, aqueous film forming foams and foam stabilizers
  申请人：Boggs Janet

  公开号：US20070161537A1

  公开（公告）日：2007-07-12

  Production processes and systems are provided that include reacting halogenated compounds, dehalogenating compounds, reacting alcohols, reacting olefins and a saturated compounds, reacting reactants having at least two —CF 3 groups with reactants having cyclic groups. R F -compositions such as R F -intermediates, R F -surfactants, R F monomers, R F -monomer units, R F -metal complexes, R F -phosphate esters, R F -glycols, R F -urethanes, and/or R F -foam stabilizers. The R F portion can include at least two CF 3 groups, at least three —CF 3 groups, and/or at least two —CF 3 groups and at least two —CH 2 — groups. Detergents, emulsifiers, paints, adhesives, inks, wetting agents, foamers, and defoamers including the R F -surfactant composition are provided. Acrylics, resins, and polymers are provided that include a R F -monomer unit. Compositions are provided that include a substrate having a R F -composition thereover. Aqueous Film Forming Foam (“AFFF”) formulations are provided that can include R F surfactants and/or R F -foam stabilizers are provided.

  提供了生产过程和系统，其中包括反应卤代化合物，去卤化化合物，反应醇，反应烯烃和饱和化合物，反应至少有两个—CF3基团的反应物与具有环状基团的反应物反应。提供了RF组分，例如RF中间体，RF表面活性剂，RF单体，RF单体单元，RF金属配合物，RF磷酸酯，RF乙二醇，RF聚氨酯和/或RF泡沫稳定剂。RF部分可以包括至少两个 基团，至少三个— 基团，以及至少两个— 基团和至少两个—CH2—基团。提供了包括RF表面活性剂组分的洗涤剂、乳化剂、油漆、粘合剂、油墨、润湿剂、起泡剂和消泡剂。提供了包括RF单体单元的丙烯酸、树脂和聚合物。提供了包括具有RF组分的基底的组合物。提供了可以包括RF表面活性剂和/或RF泡沫稳定剂的水性成膜泡沫（“AFFF”）配方。
• PRODUCTION PROCESSES AND SYSTEMS, COMPOSITIONS, SURFACTANTS, MONOMER UNITS, METAL COMPLEXES, PHOSPHATE ESTERS, GLYCOLS, AQUEOUS FILM FORMING FOAMS, AND FOAM STABILIZERS
  申请人：Boggs Janet

  公开号：US20120071689A1

  公开（公告）日：2012-03-22

  Production processes and systems are provided that include reacting halogenated compounds, dehalogenating compounds, reacting alcohol's, reacting olefins and a saturated compounds, reacting reactants having at least two —CF 3 groups with reactants having cyclic groups, R F -compositions such as R F -intermediates, R F -surfactants, R F -monomers, R F -monomer units, R F -metal complexes, R F -phosphate esters, R F -glycols, R F -urethanes, and or R F -foam stabilizers. The R F portion can include at least two groups —CF 3 groups, at least three —CF 3 groups, and/or at least two —CF 3 groups and at least two —CH 2 groups. Detergents, emulsifiers, paints, adhesives, inks, wetting agents, foamers, and defoamers including the R F -surfactant composition are provided. Acrylics, resins, and polymers are provided that include a R F -monomer unit. Compositions are provided that include a substrate having a R F -composition thereover. Aqueous Film Forming Foam (“AFFF”) formulations are provided that can include R F -surfactants and/or R F -foam stabilizers are provided.

  提供生产过程和系统，包括反应卤代化合物、去卤化化合物、反应醇、反应烯烃和饱和化合物、将至少具有两个—CF3基团的反应物与具有环状基团的反应物反应，RF组分，如RF中间体、RF表面活性剂、RF单体、RF单体单元、RF金属配合物、RF磷酸酯、RF乙二醇、RF聚氨酯和/或RF泡沫稳定剂。RF部分可以包括至少两个— 基团、至少三个— 基团和/或至少两个— 基团和至少两个—CH2基团。提供了包括RF表面活性剂组分的洗涤剂、乳化剂、油漆、粘合剂、油墨、润湿剂、起泡剂和消泡剂。提供了包括RF单体单元的丙烯酸、树脂和聚合物。提供了包括RF组分的基底上的组合物。提供了可以包括RF表面活性剂和/或RF泡沫稳定剂的水性成膜泡沫（“AFFF”）配方。
• Copolymer compositions
  申请人：PARAGON OPTICAL INC

  公开号：EP0242080A2

  公开（公告）日：1987-10-21

  New copolymer composition, methods for processing the copolymers into optical devices and articles resulting therefrom, especially intraocular and contact lenses having outstanding extended wear and daily wear properties. The composition comprises, in weight percent: from 3% to 35% polyfluoroalkyl acrylate; from 45% to 65% acryloxyalkylpolysiloxane; l% to l5% acryl­oxyalkylsilanol; 2% to 20% polyacryloxyalkylpolysiloxane; 2% to l5% polyol polyacrylate and 2% to l5% polymerizable ethylenically unsaturated monomeric wetting agent such as acrylic acid. The composition may also contain 0 to l5% acrylate acid ester of a monohydric alcohol having no more than l0 carbon atoms and from 0.05% to 2.0% of a free radical initiator.

  新的共聚物组合物、将共聚物加工成光学设备的方法以及由此产生的物品，特别是具有出色的长期佩戴和日常佩戴特性的眼内镜片和隐形眼镜。以重量百分比计，该组合物包括：3%至35%的聚氟烷基丙烯酸酯；45%至65%的丙烯酰氧基烷基聚硅氧烷；l%至l5%的丙烯酰氧基烷基硅醇；2%至20%的聚丙烯酰氧基烷基聚硅氧烷；2%至l5%的多元醇聚丙烯酸酯和2%至l5%的可聚合乙烯基不饱和单体润湿剂，如丙烯酸。该组合物还可含有 0%至 l5%不超过 l0 个碳原子的一元醇丙烯酸酯和 0.05%至 2.0%的自由基引发剂。
• Composition for forming a resist upper-layer film and method for producing a semiconductor device using the composition
  申请人：NISSAN CHEMICAL INDUSTRIES, LTD.

  公开号：US10042258B2

  公开（公告）日：2018-08-07

  This composition for forming an extreme-ultraviolet (EUV) or electron-beam upper-layer resist film including (a) a polymer (P) and (b) a solvent, the solvent containing 1 to 13 mass % of a C4-12 ketone compound with respect to the entire solvent, is used in the lithography process of a procedure for manufacturing a semiconductor device. Without needing to be intermixed with a resist, and particularly on the occasion of EUV exposure, the composition for forming an EUV or electron-beam upper-layer resist film blocks undesirable exposure light, e.g., ultraviolet (UV) or deep ultraviolet (DUV) rays, and selectively transmits only the EUV rays, and can be developed using a developing solution after exposure.

  这种用于形成极紫外（EUV）或电子束上层抗蚀剂薄膜的组合物包括（a）聚合物（P）和（b）溶剂，溶剂中的C4-12酮化合物占整个溶剂的1-13质量％，用于半导体设备制造过程中的光刻工艺。这种用于形成 EUV 或电子束上层抗蚀剂薄膜的组合物无需与抗蚀剂混合，尤其是在进行 EUV 曝光时，可阻挡不希望的曝光光（例如紫外线 (UV) 或深紫外线 (DUV)），并选择性地只透射 EUV 射线，曝光后可使用显影液进行显影。
• Contact lenses and materials and methods of making same
  申请人：PILKINGTON BARNES HIND, INC.

  公开号：EP0345994B1

  公开（公告）日：1995-08-02