Methyl 3,5,7-trimethyladamantane-1-carboxylate

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 羧酸及其衍生物
• 英文名称: Methyl 3,5,7-trimethyladamantane-1-carboxylate
• 化学式: C₁₅H₂₄O₂
• 分子量: 236.35
• InChiKey: LZOJSFBNPPJEQT-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.9
• 重原子数：
  17
• 可旋转键数：
  2
• 环数：
  4.0
• sp3杂化的碳原子比例：
  0.93
• 拓扑面积：
  26.3
• 氢给体数：
  0
• 氢受体数：
  2

文献信息

• RADIATION-SENSITIVE RESIN COMPOSITION
  申请人：JSR Corporation

  公开号：EP1602975A1

  公开（公告）日：2005-12-07

  A radiation-sensitive resin composition comprising an acid-labile group-containing resin obtained by living radical polymerization having a specific structure which is insoluble or scarcely soluble in alkali, but becomes alkali soluble by the action of an acid, and a photoacid generator, wherein the ratio of weight average molecular weight to number average molecular weight (weight average molecular weight/number average molecular weight) of the acid-labile group-containing-resin is smaller than 1.5.

  一种辐射敏感树脂组合物，包括一种通过活自由基聚合获得的具有特定结构的含酸基团树脂，该树脂不溶于碱或几乎不溶于碱，但在酸的作用下可溶于碱，还包括一种光酸发生器，其中含酸基团树脂的重量平均分子量与数量平均分子量之比（重量平均分子量/数量平均分子量）小于 1.5。
• FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION
  申请人：JSR Corporation

  公开号：EP2003148A2

  公开（公告）日：2008-12-17

  An object of the present invention is to provide a novel fluorine-containing polymer, a radiation-sensitive resin composition for liquid immersion lithography which contains the fluorine-containing polymer, which leads to a pattern having an excellent shape and excellent depth of focus, wherein the amount of an eluted component in a liquid for liquid immersion lithography such as water that comes in contact with the resist during exposure in liquid immersion lithography is little, and which provides a larger receding contact angle between the resist film and the liquid for liquid immersion lithography such as water, and a method for purifying the fluorine-containing polymer. The present resin composition comprises a novel fluorine-containing polymer (A) containing repeating units represented by the general formulae (1) and (2) and having Mw of 1,000-50,000, a resin (B) having an acid-unstable group, a radiation-sensitive acid generator (C), a nitrogen-containing compound (D) and a solvent (E).

  本发明的目的是提供一种新型含氟聚合物、一种用于液浸光刻的辐射敏感树脂组合物，该组合物含有该含氟聚合物，可使图案具有极佳的形状和极佳的焦深、其中，在液浸光刻过程中，液浸光刻用液体（如水）中与光刻胶接触的被洗脱成分的量很少，而且光刻胶膜与液浸光刻用液体（如水）之间的后退接触角较大；以及一种纯化含氟聚合物的方法。本树脂组合物包括含有通式（1）和（2）表示的重复单元且 Mw 为 1,000-50,000 的新型含氟聚合物（A）、具有酸不稳定基团的树脂（B）、辐射敏感酸发生器（C）、含氮化合物（D）和溶剂（E）。
• Fluorine-containing polymer, purification method, and radiation-sensitive resin composition
  申请人：JSR CORPORATION

  公开号：US10082733B2

  公开（公告）日：2018-09-25

  An object of the present invention is to provide a novel fluorine-containing polymer, a radiation-sensitive resin composition for liquid immersion lithography which contains the fluorine-containing polymer, which leads to a pattern having an excellent shape and excellent depth of focus, wherein the amount of an eluted component in a liquid for liquid immersion lithography such as water that comes in contact with the resist during exposure in liquid immersion lithography is little, and which provides a larger receding contact angle between the resist film and the liquid for liquid immersion lithography such as water, and a method for purifying the fluorine-containing polymer. The present resin composition comprises a novel fluorine-containing polymer (A) containing repeating units represented by the general formulae (1) and (2) and having Mw of 1,000-50,000, a resin (B) having an acid-unstable group, a radiation-sensitive acid generator (C), a nitrogen-containing compound (D) and a solvent (E).

  本发明的目的是提供一种新型含氟聚合物、一种用于液浸光刻的辐射敏感树脂组合物，该组合物含有该含氟聚合物，可使图案具有极佳的形状和极佳的焦深、其中，在液浸光刻过程中，液浸光刻用液体（如水）中与光刻胶接触的被洗脱成分的量很少，而且光刻胶膜与液浸光刻用液体（如水）之间的后退接触角较大；以及一种纯化含氟聚合物的方法。本树脂组合物包括含有通式（1）和（2）表示的重复单元且 Mw 为 1,000-50,000 的新型含氟聚合物（A）、具有酸不稳定基团的树脂（B）、辐射敏感酸发生器（C）、含氮化合物（D）和溶剂（E）。
• RADIATION-SENSITIVE RESIN COMPOSITION COMPRISING A FLUORINE-CONTAINING POLYMER
  申请人：JSR Corporation

  公开号：EP2003148B1

  公开（公告）日：2017-07-19
• SCREENING METHODS FOR AMYLOID BETA MODULATORS
  申请人：Slon-Usakiewicz Jacek

  公开号：US20110028719A1

  公开（公告）日：2011-02-03

  The present invention relates to methods for screening, identifying, and/or quantifying modulators of amyloid and/or aggregates, fibrils or components thereof, in particular modulators of amyloid β-peptide (Aβ) or Aβ fibrils. Aspects of the invention provide methods for screening putative modulators against an Amyloid target, in particular an Aβ target, so as to determine which modulators bind to or interact with the target, or interfere with the interaction of an indicator agent and the target. Particular aspects of the invention employ mass spectrometric methods for the screening of an Amyloid target against compound libraries, in particular mixtures of compounds or combinatorial libraries.