1-(4-methoxy-phenyl)-tetrahydro-thiopyranium | 66443-08-1

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯酚醚
• 英文名称: 1-(4-methoxy-phenyl)-tetrahydro-thiopyranium
• 英文别名: 1-(4-Methoxyphenyl)thian-1-ium
• CAS: 66443-08-1
• 化学式: C₁₂H₁₇OS
• 分子量: 209.332
• InChiKey: SJOTUCUITNTTEO-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.3
• 重原子数：
  14
• 可旋转键数：
  2
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.5
• 拓扑面积：
  10.2
• 氢给体数：
  0
• 氢受体数：
  1

文献信息

• SALT AND PHOTORESIST COMPOSITION COMPRISING THE SAME
  申请人：ANRYU Yukako

  公开号：US20120122032A1

  公开（公告）日：2012-05-17

  The present invention provides a salt represented by the formula (I): wherein R 1 , R 2 , L 1 , Y, R 3 , R 4 , R 5 , R 6 , R 7 , n, s, and R 8 represent variables outlined in the specification.
• RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
  申请人：ICHIKAWA Koji

  公开号：US20130022917A1

  公开（公告）日：2013-01-24

  A resist composition having a resin having a structural unit represented by the formula (I), a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid and not including the structural unit represented by the formula (I), and an acid generator represented by the formula (II), wherein R 1 , A 1 , R 2 , R II1 , R II2 , L II1 , Y II1 , R II3 , R II4 , R II5 , R II6 , R II7 , n, s and R II8 are defined in the specification.
• MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：US20170226252A1

  公开（公告）日：2017-08-10

  A monomer having a substituent group capable of polarity switch under the action of acid is provided. A useful polymer is obtained by polymerizing the monomer. A resist composition comprising the polymer has improved development properties and is processed to form a negative pattern having high resolution and etch resistance which is insoluble in alkaline developer.
• US8921029B2
  申请人：——

  公开号：US8921029B2

  公开（公告）日：2014-12-30
• US9260407B2
  申请人：——

  公开号：US9260407B2

  公开（公告）日：2016-02-16