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1,1,1,3,3,3-Hexafluoropropan-2-yl 2,4-dimethyl-2-(2-methylpropyl)pentanoate

中文名称
——
中文别名
——
英文名称
1,1,1,3,3,3-Hexafluoropropan-2-yl 2,4-dimethyl-2-(2-methylpropyl)pentanoate
英文别名
1,1,1,3,3,3-hexafluoropropan-2-yl 2,4-dimethyl-2-(2-methylpropyl)pentanoate
1,1,1,3,3,3-Hexafluoropropan-2-yl 2,4-dimethyl-2-(2-methylpropyl)pentanoate化学式
CAS
——
化学式
C14H22F6O2
mdl
——
分子量
336.31
InChiKey
ZMMIBRYANKACMJ-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    6.1
  • 重原子数:
    22
  • 可旋转键数:
    7
  • 环数:
    0.0
  • sp3杂化的碳原子比例:
    0.93
  • 拓扑面积:
    26.3
  • 氢给体数:
    0
  • 氢受体数:
    8

文献信息

  • ADDITIVE AND RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING THE SAME
    申请人:NISSAN CHEMICAL INDUSTRIES, LTD.
    公开号:US20170108777A1
    公开(公告)日:2017-04-20
    An additive for a resist underlayer film-forming composition containing a copolymer having structural units of Formulae (1) to (4), and a resist underlayer film-forming composition containing the additive: (where each R 1 is independently a hydrogen atom or methyl group, Ar is arylene group, Pr is a protecting group or a hydrogen atom, X is a direct bond or a —C(═O)O—R 2 — group, R 2 constituting the —C(═O)O—R 2 — group is a C 1-3 alkylene group, the alkylene group is bonded to a sulfur atom, R 3 is a hydrogen atom, methyl group, methoxy group, or halogeno group, R 4 is a C 1-3 alkyl group in which at least one hydrogen atom is substituted with a fluoro group, and Z is an organic group having 4 to 7-membered ring lactone skeleton, adamantane skeleton, or norbornane skeleton).
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