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(5-{[5-({3-[(3-carbonyl-4-hydroxyphenyl)methyl]-5-cyclohexyl-4-hydroxyphenyl}cyclohexyl)-3-cyclohexyl-2-hydroxyphenyl]methyl}-2-hydroxyphenyl)formaldehyde | 908143-05-5

中文名称
——
中文别名
——
英文名称
(5-{[5-({3-[(3-carbonyl-4-hydroxyphenyl)methyl]-5-cyclohexyl-4-hydroxyphenyl}cyclohexyl)-3-cyclohexyl-2-hydroxyphenyl]methyl}-2-hydroxyphenyl)formaldehyde
英文别名
1,1-bis[3-(3-formyl-4-hydroxyphenyl)methyl-4-hydroxy-5-cyclohexylphenyl]cyclohexane;5-[[3-Cyclohexyl-5-[1-[3-cyclohexyl-5-[(3-formyl-4-hydroxyphenyl)methyl]-4-hydroxyphenyl]cyclohexyl]-2-hydroxyphenyl]methyl]-2-hydroxybenzaldehyde
(5-{[5-({3-[(3-carbonyl-4-hydroxyphenyl)methyl]-5-cyclohexyl-4-hydroxyphenyl}cyclohexyl)-3-cyclohexyl-2-hydroxyphenyl]methyl}-2-hydroxyphenyl)formaldehyde化学式
CAS
908143-05-5
化学式
C46H52O6
mdl
——
分子量
700.915
InChiKey
LGHKDMAXUYPGAH-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    13.6
  • 重原子数:
    52
  • 可旋转键数:
    10
  • 环数:
    7.0
  • sp3杂化的碳原子比例:
    0.43
  • 拓扑面积:
    115
  • 氢给体数:
    4
  • 氢受体数:
    6

上下游信息

  • 上游原料
    中文名称 英文名称 CAS号 化学式 分子量

反应信息

点击查看最新优质反应信息

文献信息

  • WO2006/90757
    申请人:——
    公开号:——
    公开(公告)日:——
  • POSITIVE RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN AND COMPOUND
    申请人:Shiono Daiju
    公开号:US20090035691A1
    公开(公告)日:2009-02-05
    A positive resist composition that includes a base material component (A) that contains an acid-dissociable, dissolution-inhibiting group and exhibits increased alkali solubility under the action of acid, and an acid generator component (B) that generates acid upon exposure, wherein the base material component (A) contains a compound (A 1 ), in which either a portion of, or all of, the hydrogen atoms of phenolic hydroxyl groups within a polyhydric phenol compound with a molecular weight of 300 to 2,500 represented by a general formula (I) shown below have been substituted with at least one group selected from the group consisting of acid-dissociable, dissolution-inhibiting groups represented by a general formula (II) shown below and acid-dissociable, dissolution-inhibiting groups represented by a general formula (III) shown below.
  • NOVEL BIS-(HYDROXYBENZALDEHYDE) COMPOUND AND NOVEL POLYNUCLEAR POLYPHENOL COMPOUND DERIVED THEREFROM AND METHOD FOR PRODUCTION THEREOF
    申请人:Yoshitomo Akira
    公开号:US20090076310A1
    公开(公告)日:2009-03-19
    Provide a new bis-(hydroxybenzaldehyde) compound, as well as a new polynuclear polyphenol compound derived therefrom, suitable for use as component materials for photosensitive resist compositions, component materials and hardeners for epoxy resins, developers and anti-fading agents used in thermosensitive recording materials, bactericides, fungicides, antioxidants and other functional chemical products or component materials thereof, wherein such bis-(hydroxybenzaldehyde) compound is produced by reacting in the presence of trihalogenated acetic acid catalyst or phosphoric acid catalyst a 2,6-di(hydroxymethyl)-4-alkylphenol with a hydroxybenzaldehyde expressed by general formula (14).
  • US7586009B2
    申请人:——
    公开号:US7586009B2
    公开(公告)日:2009-09-08
  • US7648816B2
    申请人:——
    公开号:US7648816B2
    公开(公告)日:2010-01-19
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